G03F 7/70725
Control
Official title: {control}
G03F7/70725 (Control) appears on 1,007 US grants and 1,062 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,007
- Published applications
- 1,062
- Assignees
- 146
- Inventors
- 1,406
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 7 | 0 |
| 1991 | 7 | 0 |
| 1992 | 3 | 0 |
| 1993 | 5 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 12 | 0 |
| 1998 | 11 | 0 |
| 1999 | 13 | 0 |
| 2000 | 15 | 0 |
| 2001 | 31 | 17 |
| 2002 | 29 | 27 |
| 2003 | 27 | 43 |
| 2004 | 35 | 33 |
| 2005 | 36 | 51 |
| 2006 | 37 | 65 |
| 2007 | 36 | 44 |
| 2008 | 34 | 58 |
| 2009 | 22 | 48 |
| 2010 | 30 | 45 |
| 2011 | 31 | 44 |
| 2012 | 25 | 34 |
| 2013 | 44 | 47 |
| 2014 | 52 | 38 |
| 2015 | 39 | 57 |
| 2016 | 58 | 33 |
| 2017 | 60 | 47 |
| 2018 | 58 | 60 |
| 2019 | 66 | 42 |
| 2020 | 35 | 37 |
| 2021 | 34 | 27 |
| 2022 | 20 | 26 |
| 2023 | 26 | 32 |
| 2024 | 14 | 36 |
| 2025 | 23 | 34 |
| 2026 | 21 | 37 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Substrate processing apparatus and substrate processing method29 Sep 2026US 12,751,246 B2Tokyo Electron Limited
- Management apparatus, lithography apparatus. management method, and article manufacturing method15 Sep 2026US 12,736,928 B2Canon Kabushiki Kaisha
- Substrate processing apparatus for processing a substrate in one process chamber8 Sep 2026US 12,730,387 B2Samsung Electronics Co., Ltd.
- Active linear motor parasitic force compensation25 Aug 2026US 12,717,250 B2APPLIED Materials.Inc.
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Substrate warpage determination system8 Oct 2026US 2026/0310107 A1ASML Netherlands B. V.
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- System and method for tailoring chuck stiffness1 Oct 2026US 2026/0299437 A1ASML Netherlands B. V.
Most cited
By later US patents
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Exposure apparatus and method of manufacturing device551US 7,884,918 B2Canon Kabushiki Kaisha · 2011
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004
- Pattern generator236US 6,747,783 B1Micronic Laser Systems AB · 2004
- Exposure method and projection exposure apparatus222US 5,194,893 ANikon Corporation · 1993