G03F 7/70775
Position control
Official title: {Position control, e.g. interferometers or encoders for determining the stage position}
G03F7/70775 (Position control) appears on 1,095 US grants and 1,187 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,095
- Published applications
- 1,187
- Assignees
- 151
- Inventors
- 1,529
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 7 | 0 |
| 1999 | 3 | 0 |
| 2000 | 9 | 0 |
| 2001 | 22 | 8 |
| 2002 | 9 | 18 |
| 2003 | 17 | 27 |
| 2004 | 18 | 26 |
| 2005 | 26 | 47 |
| 2006 | 28 | 44 |
| 2007 | 39 | 51 |
| 2008 | 46 | 63 |
| 2009 | 39 | 70 |
| 2010 | 25 | 45 |
| 2011 | 32 | 52 |
| 2012 | 33 | 43 |
| 2013 | 45 | 49 |
| 2014 | 55 | 48 |
| 2015 | 51 | 57 |
| 2016 | 72 | 46 |
| 2017 | 67 | 70 |
| 2018 | 89 | 81 |
| 2019 | 88 | 74 |
| 2020 | 61 | 63 |
| 2021 | 55 | 42 |
| 2022 | 32 | 40 |
| 2023 | 43 | 31 |
| 2024 | 23 | 38 |
| 2025 | 19 | 25 |
| 2026 | 27 | 29 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
- Positioning system and method of forming the same3 Sep 2026US 2026/0259510 A1Agency for Science, Technology and Research
- Stage apparatus, substrate processing apparatus, information processing apparatus, information processing method, storage medium, and article manufacturing method27 Aug 2026US 2026/0251985 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Exposure apparatus and method of manufacturing device551US 7,884,918 B2Canon Kabushiki Kaisha · 2011
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001
- Differential interferometer system and lithographic step-and-scan apparatus provided with such a system426US 6,046,792 AU. S. Philips Corporation · 2000
- Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement318US 5,646,413 ANikon Corporation · 1997