G03F 7/70766
Reaction force control means
Official title: {Reaction force control means, e.g. countermass}
G03F7/70766 (Reaction force control means) appears on 151 US grants and 161 published applications in this corpus.
Search patents in G03F- Granted patents
- 151
- Published applications
- 161
- Assignees
- 34
- Inventors
- 296
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 8 | 6 |
| 2002 | 7 | 10 |
| 2003 | 10 | 16 |
| 2004 | 8 | 15 |
| 2005 | 19 | 19 |
| 2006 | 10 | 7 |
| 2007 | 8 | 9 |
| 2008 | 7 | 7 |
| 2009 | 6 | 7 |
| 2010 | 6 | 5 |
| 2011 | 5 | 8 |
| 2012 | 2 | 3 |
| 2013 | 4 | 3 |
| 2014 | 4 | 4 |
| 2015 | 5 | 4 |
| 2016 | 4 | 3 |
| 2017 | 3 | 8 |
| 2018 | 9 | 4 |
| 2019 | 6 | 6 |
| 2020 | 6 | 3 |
| 2021 | 4 | 0 |
| 2022 | 1 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 3 |
| 2025 | 0 | 5 |
| 2026 | 1 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Vertical motion axis for imaging optical head11 Aug 2026US 12,704,791 B2Orbotech Ltd.
- Elastic guiding device, positioning device, blade and lithographic apparatus23 Aug 2022US 11,421,729 B2ASML Netherlands B. V.
- Imprint device and method for manufacturing article28 Dec 2021US 11,209,731 B2Canon Kabushiki Kaisha
- Positioning device, stiffness reduction device and electron beam apparatus28 Sep 2021US 11,131,937 B2ASML Netherlands B. V.
- Positioning system and lithographic apparatus11 May 2021US 11,003,095 B2ASML Holding N. V.
- Systems and methods for clamping a patterning device in a lithography apparatus10 Sep 2026US 2026/0267237 A1ASML Netherlands B. V.
- Stage apparatus, lithography apparatus, article manufacturing method, and driving method for stage apparatus6 Aug 2026US 2026/0227712 A1Canon Kabushiki Kaisha
- Stage apparatus, lithography apparatus, and article manufacturing method6 Aug 2026US 2026/0227713 A1Canon Kabushiki Kaisha
- Stage apparatus, substrate processing apparatus and article manufacturing method23 Jul 2026US 2026/0211340 A1Canon Kabushiki Kaisha
- Method for reducing the effects of parasitic forces and/or moments on the imaging quality of a projection-exposure apparatus, and projection-exposure apparatus with a module2 Jul 2026US 2026/0186427 A1ASML Netherlands B. V.
Most cited
By later US patents
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane560US 7,489,389 B2Nikon Corporation · 2009
- Stage device and exposure apparatus157US 6,417,914 B1Nikon Corporation · 2002
- Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device137US 5,815,246 AU. S. Philips Corporation · 1998
- Stage apparatus, scanning type exposure apparatus, and device produced with the same122US 6,331,885 B1Nikon Corporation · 2001