Systems and methods for clamping a patterning device in a lithography apparatus
AssigneeASML Netherlands B.V.
InventorDirk-Jan BIJVOET
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Abstract
A patterning device (e.g., a reticle) is typically clamped by a vacuum clamp to a chuck in a lithography apparatus, the chuck configured to drive the patterning device in a scan direction. Acceleration of the patterning device for a scan often causes deformation of the patterning device in a corkscrew like and/or twisting shape. A new clamping system is described, which includes a vacuum clamp configured to apply a clamping force to the patterning device, and an actuator configured to apply an actuation force to the patterning device to reduce or eliminate deformation (e.g., twist deformation) imparted to the patterning device during the acceleration. The actuator is configured to apply the actuation force responsive to the acceleration.
Claims20
A clamping system, comprising:
- a clamp configured to apply a clamping force to a patterning device to clamp the patterning device during acceleration;
- and
- an actuator configured to apply an actuation force to the patterning device to reduce deformation imparted to the patterning device during the acceleration, the actuator configured to apply the actuation force responsive to the acceleration.
A clamping method, comprising:
- applying, with a clamp, a clamping force to a patterning device to clamp the patterning device during acceleration;
- and
- applying, with an actuator, an actuation force to the patterning device to reduce deformation imparted to the patterning device during the acceleration, the actuator configured to apply the actuation force responsive to the acceleration.
Dependencies are inferred from the claim text.