G03F 7/70783
Handling stress or warp of chucks, masks or workpieces
Official title: {Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight}
G03F7/70783 (Handling stress or warp of chucks, masks or workpieces) appears on 534 US grants and 628 published applications in this corpus.
Search patents in G03F- Granted patents
- 534
- Published applications
- 628
- Assignees
- 136
- Inventors
- 1,106
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 4 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 4 | 4 |
| 2003 | 3 | 5 |
| 2004 | 4 | 15 |
| 2005 | 10 | 38 |
| 2006 | 18 | 29 |
| 2007 | 20 | 33 |
| 2008 | 23 | 27 |
| 2009 | 13 | 31 |
| 2010 | 23 | 36 |
| 2011 | 21 | 28 |
| 2012 | 22 | 22 |
| 2013 | 29 | 14 |
| 2014 | 25 | 21 |
| 2015 | 29 | 30 |
| 2016 | 27 | 29 |
| 2017 | 26 | 21 |
| 2018 | 27 | 35 |
| 2019 | 45 | 31 |
| 2020 | 32 | 33 |
| 2021 | 21 | 26 |
| 2022 | 24 | 21 |
| 2023 | 15 | 22 |
| 2024 | 20 | 33 |
| 2025 | 17 | 19 |
| 2026 | 17 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Frequency and amplitude modulation of implant dose for stress management22 Sep 2026US 12,743,030 B2APPLIED Materials.Inc.
- Imprinting apparatus15 Sep 2026US 12,736,872 B2Koninklijke Philips N. V.
- Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method18 Aug 2026US 12,710,700 B2Canon Kabushiki Kaisha
- Lithographic apparatus and an object positioning system28 Jul 2026US RE50,970 E1ASML Netherlands B. V.
- Substrate warpage determination system7 Jul 2026US 12,675,052 B2ASML Netherlands B. V.
- Substrate warpage determination system8 Oct 2026US 2026/0310107 A1ASML Netherlands B. V.
- System and method for tailoring chuck stiffness1 Oct 2026US 2026/0299437 A1ASML Netherlands B. V.
- Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method1 Oct 2026US 2026/0299438 A1Canon Kabushiki Kaisha
- Object holder, object table, method of controlling the shape of a surface, method of manufacturing the object holder, and their use in a lithographic method or apparatus1 Oct 2026US 2026/0299440 A1ASML Netherlands B. V.
- Systems and methods for clamping a patterning device in a lithography apparatus10 Sep 2026US 2026/0267237 A1ASML Netherlands B. V.
Most cited
By later US patents
- Transparent optical chuck incorporating optical monitoring160US 5,515,167 AHughes Aircraft Company · 1996
- Pattern writing method during X-ray mask fabrication89US 5,663,018 AMotorola, Inc. · 1997
- Method for error reduction in lithography66US 6,883,158 B1Micronic Laser Systems AB · 2005
- Optical system, especially a projection light facility for microlithography63US 6,388,823 B1Carl-Zeiss-Stiftung trading as Carl Zeiss · 2002
- Exposure apparatus for transferring a mask pattern onto a substrate50US 5,737,064 AMatsushita Electric Industrial Co., Ltd. · 1998