US 5,737,064 A · Exposure apparatus for transferring a mask pattern onto a substrate

Abstract

An exposure method for irradiating a mask from above the mask held in proximity to a substrate positioned below the mask to transfer a mask pattern of the mask to a photosensitive layer of the substrate by exposing the photosensitive layer to a light beam, includes the steps of using a gap-measuring device to measure a gap between a portion of the mask to be locally scanned and irradiated and a portion of the substrate to be locally irradiated, comparing a value measured by the gap-measuring device with a preset value, and locally deforming the mask and/or the substrate according to a difference between the value measured by the gap-measuring device and the preset value so as to cause the gap to approach a predetermined value.

Claims10

Dependent claims

An exposure apparatus for irradiating a mask from above the mask held in proximity to a substrate to transfer a mask pattern of the mask to the substrate by exposing the substrate to a light beam, comprising:

a locally-irradiating means, for scanning the mask from above the mask, having a mask-deforming means for flexing the mask locally by a static pressure so as to cause the mask and the substrate to each other;
a gap-measuring means for measuring a gap between the mask and the substrate at a portion of the mask irradiated by the locally-irradiating means and at a portion of the substrate irradiated thereby;
and
a control means for controlling the mask-deforming means, based on a value measured by the gap-measuring means and a preset value.

1 more element

a locally-irradiating means for scanning the mask from above the mask;
a gap-measuring means for measuring a gap between the mask and the substrate at a portion of the mask irradiated by the locally-irradiating means and at a portion of the substrate irradiated thereby;
a chuck comprising a slight-moving means for drawing and holding the substrate and vertically moving a portion, of the mask, to be irradiated by the locally-irradiating means so as to cause the substrate and the mask to approach each other locally;
and
a control means for controlling the slight-moving means based on a value measured by the gap-measuring means and a preset value.

2 more elements

Dependencies are inferred from the claim text.

Exposure apparatus for transferring a mask pattern onto a substrate

Life of this patent

Exposure apparatus for transferring a mask pattern onto a substrate

Life of this patent

Abstract

Claims10