G03F 7/707
Chucks
Official title: {Chucks, e.g. chucking or un-chucking operations or structural details}
G03F7/707 (Chucks) appears on 1,138 US grants and 1,185 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,138
- Published applications
- 1,185
- Assignees
- 223
- Inventors
- 2,006
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 2 | 0 |
| 1985 | 7 | 0 |
| 1986 | 3 | 0 |
| 1987 | 5 | 0 |
| 1988 | 5 | 0 |
| 1989 | 6 | 0 |
| 1990 | 5 | 0 |
| 1991 | 4 | 0 |
| 1992 | 7 | 0 |
| 1993 | 8 | 0 |
| 1994 | 3 | 0 |
| 1995 | 6 | 0 |
| 1996 | 12 | 0 |
| 1997 | 11 | 0 |
| 1998 | 19 | 0 |
| 1999 | 16 | 0 |
| 2000 | 14 | 0 |
| 2001 | 28 | 12 |
| 2002 | 25 | 46 |
| 2003 | 34 | 41 |
| 2004 | 34 | 50 |
| 2005 | 43 | 70 |
| 2006 | 43 | 53 |
| 2007 | 38 | 67 |
| 2008 | 32 | 49 |
| 2009 | 36 | 45 |
| 2010 | 32 | 37 |
| 2011 | 32 | 40 |
| 2012 | 25 | 26 |
| 2013 | 32 | 43 |
| 2014 | 34 | 34 |
| 2015 | 47 | 48 |
| 2016 | 55 | 42 |
| 2017 | 47 | 41 |
| 2018 | 43 | 59 |
| 2019 | 57 | 46 |
| 2020 | 49 | 55 |
| 2021 | 40 | 45 |
| 2022 | 40 | 51 |
| 2023 | 40 | 48 |
| 2024 | 32 | 61 |
| 2025 | 43 | 36 |
| 2026 | 33 | 40 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Systems and methods for inspecting a portion of a lithography apparatus22 Sep 2026US 12,743,031 B1ASML Netherlands B. V.
- Reticle exchange device with reticle levitation22 Sep 2026US 12,745,594 B2Massachusetts Institute of Technology
- Imprinting apparatus15 Sep 2026US 12,736,872 B2Koninklijke Philips N. V.
- Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method15 Sep 2026US 12,736,887 B2ASML Netherlands B. V.
- Split double sided wafer and reticle clamps25 Aug 2026US 12,717,249 B2ASML Holding N. V.
- Workpiece support8 Oct 2026US 2026/0310106 A1Taiwan Semiconductor Manufacturing Company.Ltd
- System and method for tailoring chuck stiffness1 Oct 2026US 2026/0299437 A1ASML Netherlands B. V.
- Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method1 Oct 2026US 2026/0299438 A1Canon Kabushiki Kaisha
- Object holder, object table, method of controlling the shape of a surface, method of manufacturing the object holder, and their use in a lithographic method or apparatus1 Oct 2026US 2026/0299440 A1ASML Netherlands B. V.
- Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus24 Sep 2026US 2026/0288020 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Substrate holding apparatus and exposure apparatus including substrate holding apparatus491US 6,710,857 B2Nikon Corporation · 2004
- Precision motion stage with single guide beam and follower stage461US 5,623,853 ANikon Precision Inc. · 1997