Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTOSHIYUKI MYOJO, SHIGEO KOYA, KAZUNORI NAKAJIMA
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorsTOSHIYUKI MYOJO, SHIGEO KOYA, KAZUNORI NAKAJIMA
Estimating the term…
A stage apparatus includes a substrate chuck configured to support a substrate, a supplier configured to supply a gas to a space between the substrate and the substrate chuck, a pin member configured to support the substrate by protruding from a hole formed in the substrate chuck, a driver configured to relatively move the substrate chuck and the pin member, a detector configured to detect a gap between an end portion of the substrate and the substrate chuck, and a controller configured to control gas supply by the supplier based on a result of detection by the detector in an operation of separating the substrate and the substrate chuck by the driver.
A stage apparatus comprising:
A control method of a stage apparatus including a substrate chuck configured to support a substrate, a supplier configured to supply a gas to a space between the substrate and the substrate chuck, a pin member configured to support the substrate by protruding from a hole formed in the substrate chuck, and a driver configured to move at least one of the substrate chuck and the pin member, the method comprising:
Dependencies are inferred from the claim text.