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US 12,743,031 B1Granted
Systems and methods for inspecting a portion of a lithography apparatus
AssigneeASML Netherlands B.V.
InventorNaveen Kumar Sankaran
Life of this patent
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AssigneeASML Netherlands B.V.
InventorNaveen Kumar Sankaran
Estimating the term…
An inspection system includes a body that is configured to be inserted into a lithography apparatus, to be engaged by a tool handler of the lithography apparatus, and to be used for inspecting a portion of the lithography apparatus. A sensor is coupled to the body, and configured to obtain an image of the portion of the lithography apparatus when the body is positioned by the tool handler. Software is configured to receive the images and facilitate semi-automated or automated inspection of the portion of the lithography apparatus based on the one or more images. The system may use less time for inspection, may produce consistent imaging resolution and clarity, may not require opening or other disassembly of the lithography apparatus, may reduce impact on a lithography apparatus micro-environment and the potential for contamination, and/or may have one or more additional or other advantages.
A system for inspecting a portion of a lithography apparatus, the system comprising:
A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, when executed by one or more processors, are configured to cause the one or more processors to at least:
A method for inspecting a portion of a lithography apparatus, the method comprising:
Dependencies are inferred from the claim text.