G03F 7/70733
Handling masks and workpieces
Official title: {Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask}
G03F7/70733 (Handling masks and workpieces) appears on 1,113 US grants and 1,162 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,113
- Published applications
- 1,162
- Assignees
- 222
- Inventors
- 2,016
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 4 | 0 |
| 1986 | 5 | 0 |
| 1987 | 4 | 0 |
| 1988 | 5 | 0 |
| 1989 | 9 | 0 |
| 1990 | 5 | 0 |
| 1991 | 6 | 0 |
| 1992 | 6 | 0 |
| 1993 | 5 | 0 |
| 1994 | 8 | 0 |
| 1995 | 13 | 0 |
| 1996 | 8 | 0 |
| 1997 | 7 | 0 |
| 1998 | 14 | 0 |
| 1999 | 15 | 0 |
| 2000 | 15 | 0 |
| 2001 | 31 | 13 |
| 2002 | 27 | 33 |
| 2003 | 28 | 39 |
| 2004 | 42 | 48 |
| 2005 | 37 | 62 |
| 2006 | 46 | 75 |
| 2007 | 39 | 66 |
| 2008 | 40 | 46 |
| 2009 | 32 | 49 |
| 2010 | 27 | 34 |
| 2011 | 28 | 53 |
| 2012 | 33 | 27 |
| 2013 | 38 | 36 |
| 2014 | 48 | 35 |
| 2015 | 38 | 39 |
| 2016 | 32 | 37 |
| 2017 | 55 | 40 |
| 2018 | 39 | 46 |
| 2019 | 53 | 33 |
| 2020 | 28 | 49 |
| 2021 | 39 | 52 |
| 2022 | 35 | 51 |
| 2023 | 47 | 50 |
| 2024 | 39 | 66 |
| 2025 | 38 | 48 |
| 2026 | 40 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Storage and transfer module and substrate treatment apparatus including storage and transfer module29 Sep 2026US 12,748,355 B2Semes Co., Ltd.
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Systems and methods for inspecting a portion of a lithography apparatus22 Sep 2026US 12,743,031 B1ASML Netherlands B. V.
- Reticle exchange device with reticle levitation22 Sep 2026US 12,745,594 B2Massachusetts Institute of Technology
- Semiconductor devices and methods of formation8 Oct 2026US 2026/0310095 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus24 Sep 2026US 2026/0288020 A1Canon Kabushiki Kaisha
- Lithography exposure system and lithography method using the same17 Sep 2026US 2026/0277115 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Stocker compartment10 Sep 2026US 2026/0264993 A1Brooks Automation (Germany) GmbH
- Vacuum load ports, vacuum-compatible doors, and methods for transferring a reticle pod10 Sep 2026US 2026/0267239 A1Entegris, Inc.
Most cited
By later US patents
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers604US 5,388,945 AInternational Business Machines Corporation · 1995
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001
- Exposure apparatus and method548US 6,341,007 B12002