G03F 7/70741
Handling masks outside exposure position
Official title: {Handling masks outside exposure position, e.g. reticle libraries}
G03F7/70741 (Handling masks outside exposure position) appears on 407 US grants and 421 published applications in this corpus.
Search patents in G03F- Granted patents
- 407
- Published applications
- 421
- Assignees
- 121
- Inventors
- 859
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 9 | 0 |
| 1996 | 4 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 3 | 0 |
| 2001 | 13 | 4 |
| 2002 | 14 | 20 |
| 2003 | 13 | 20 |
| 2004 | 23 | 23 |
| 2005 | 17 | 24 |
| 2006 | 18 | 30 |
| 2007 | 16 | 22 |
| 2008 | 18 | 16 |
| 2009 | 8 | 13 |
| 2010 | 18 | 7 |
| 2011 | 4 | 10 |
| 2012 | 8 | 6 |
| 2013 | 7 | 6 |
| 2014 | 7 | 6 |
| 2015 | 2 | 5 |
| 2016 | 3 | 4 |
| 2017 | 7 | 6 |
| 2018 | 7 | 7 |
| 2019 | 11 | 10 |
| 2020 | 11 | 26 |
| 2021 | 19 | 28 |
| 2022 | 17 | 29 |
| 2023 | 23 | 28 |
| 2024 | 22 | 27 |
| 2025 | 24 | 29 |
| 2026 | 18 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Systems and methods for inspecting a portion of a lithography apparatus22 Sep 2026US 12,743,031 B1ASML Netherlands B. V.
- Reticle exchange device with reticle levitation22 Sep 2026US 12,745,594 B2Massachusetts Institute of Technology
- Photomask box carrying device11 Aug 2026US 12,707,927 B2Gudeng Equipment Co., Ltd.
- Reticle pod having anti-collision gap structure14 Jul 2026US 12,685,077 B2Gudeng Precision Industrial Co., Ltd.
- Stocker compartment10 Sep 2026US 2026/0264993 A1Brooks Automation (Germany) GmbH
- Vacuum load ports, vacuum-compatible doors, and methods for transferring a reticle pod10 Sep 2026US 2026/0267239 A1Entegris, Inc.
- Orientable semiconductor container and orientation system for semiconductor container3 Sep 2026US 2026/0259513 A1Gudeng Precision Industrial Co., Ltd.
- Reticle transfer device with reticle pattern facing downward20 Aug 2026US 2026/0244117 A1HUA YANG Precision Machinery Co., Ltd
- Exposure device and substrate support member30 Jul 2026US 2026/0219586 A1Nikon Corporation
Most cited
By later US patents
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers604US 5,388,945 AInternational Business Machines Corporation · 1995
- Glass substrate-holding tool525US 8,192,901 B2Asahi Glass Company, Limited · 2012
- Positioning device having two object holders379US 6,262,796 B1ASM Lithography B. V. · 2001
- Reticle storage and retrieval system371US 6,562,094 B2PRI Automation, Inc. · 2003