G03F 7/7075
Handling workpieces outside exposure position
Official title: {Handling workpieces outside exposure position, e.g. SMIF box}
G03F7/7075 (Handling workpieces outside exposure position) appears on 367 US grants and 334 published applications in this corpus.
Search patents in G03F- Granted patents
- 367
- Published applications
- 334
- Assignees
- 95
- Inventors
- 712
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 5 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 4 | 0 |
| 1995 | 9 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 8 | 0 |
| 1999 | 7 | 0 |
| 2000 | 12 | 0 |
| 2001 | 20 | 6 |
| 2002 | 10 | 13 |
| 2003 | 12 | 10 |
| 2004 | 10 | 18 |
| 2005 | 12 | 24 |
| 2006 | 17 | 25 |
| 2007 | 9 | 23 |
| 2008 | 14 | 14 |
| 2009 | 16 | 17 |
| 2010 | 11 | 11 |
| 2011 | 11 | 19 |
| 2012 | 14 | 8 |
| 2013 | 10 | 9 |
| 2014 | 7 | 4 |
| 2015 | 13 | 9 |
| 2016 | 10 | 10 |
| 2017 | 11 | 9 |
| 2018 | 10 | 14 |
| 2019 | 16 | 6 |
| 2020 | 7 | 12 |
| 2021 | 11 | 12 |
| 2022 | 10 | 15 |
| 2023 | 5 | 8 |
| 2024 | 9 | 15 |
| 2025 | 6 | 10 |
| 2026 | 12 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Storage and transfer module and substrate treatment apparatus including storage and transfer module29 Sep 2026US 12,748,355 B2Semes Co., Ltd.
- Gripper and lithographic apparatus comprising the gripper8 Sep 2026US 12,730,386 B2ASML Netherlands B. V.
- Coating and developing device7 Jul 2026US 12,675,054 B2ACM Research Korea CO., LTD.
- Developing apparatus30 Jun 2026US 12,672,503 B2Tokyo Electron Limited
- Measurement apparatus5 May 2026US 12,618,667 B2ASML Netherlands B. V.
- Lithography exposure system and lithography method using the same17 Sep 2026US 2026/0277115 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate transfer method, substrate processing apparatus, and program13 Aug 2026US 2026/0235967 A1Tokyo Electron Limited
- Substrate processing apparatus and substrate processing method13 Aug 2026US 2026/0235970 A1Tokyo Electron Limited
- Stage apparatus, lithography apparatus, article manufacturing method, and driving method for stage apparatus6 Aug 2026US 2026/0227712 A1Canon Kabushiki Kaisha
- Exposure device and substrate support member30 Jul 2026US 2026/0219586 A1Nikon Corporation
Most cited
By later US patents
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers604US 5,388,945 AInternational Business Machines Corporation · 1995
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001
- System and method for on-the-fly eccentricity recognition543US 6,990,430 B2Brooks Automation, Inc. · 2006