G03F 7/70425
Imaging strategies
Official title: {Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning}
G03F7/70425 (Imaging strategies) appears on 3,181 US grants and 2,985 published applications in this corpus.
Search patents in G03F- Granted patents
- 3,181
- Published applications
- 2,985
- Assignees
- 596
- Inventors
- 4,991
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 2 | 0 |
| 1985 | 5 | 0 |
| 1986 | 8 | 0 |
| 1987 | 3 | 0 |
| 1988 | 8 | 0 |
| 1989 | 8 | 0 |
| 1990 | 5 | 0 |
| 1991 | 10 | 0 |
| 1992 | 18 | 0 |
| 1993 | 19 | 0 |
| 1994 | 30 | 0 |
| 1995 | 36 | 0 |
| 1996 | 40 | 0 |
| 1997 | 53 | 0 |
| 1998 | 86 | 0 |
| 1999 | 77 | 0 |
| 2000 | 83 | 0 |
| 2001 | 107 | 38 |
| 2002 | 100 | 137 |
| 2003 | 133 | 130 |
| 2004 | 108 | 139 |
| 2005 | 114 | 166 |
| 2006 | 94 | 170 |
| 2007 | 86 | 175 |
| 2008 | 109 | 145 |
| 2009 | 106 | 154 |
| 2010 | 159 | 132 |
| 2011 | 123 | 102 |
| 2012 | 121 | 114 |
| 2013 | 146 | 107 |
| 2014 | 132 | 108 |
| 2015 | 113 | 124 |
| 2016 | 101 | 84 |
| 2017 | 67 | 69 |
| 2018 | 79 | 79 |
| 2019 | 103 | 113 |
| 2020 | 125 | 100 |
| 2021 | 84 | 92 |
| 2022 | 74 | 117 |
| 2023 | 78 | 128 |
| 2024 | 70 | 90 |
| 2025 | 88 | 95 |
| 2026 | 65 | 77 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70433Layout for increasing efficiency or for compensating imaging errors1,598
- G03F 7/70466Multiple exposures921
- G03F 7/70475Stitching, i.e. connecting image fields to produce a device field, the field331
- G03F 7/7045Hybrid exposures, i.e. multiple exposures of the same area using different types121
- G03F 7/70458Mix-and-match, i.e. multiple exposures of the same area using a similar type120
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Method of manufacturing memory device6 Oct 2026US 12,757,394 B2Winbond Electronics Corp.
- System and method for 3d mask model based on huygens-fresnel principle8 Oct 2026US 2026/0310063 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Curvilinear lithography masks and geometry-based mask check rules for curvilinear lithography masks8 Oct 2026US 2026/0310092 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Operating device and operating method for optical proximity correction8 Oct 2026US 2026/0310093 A1United Microelectronics Corp.
Most cited
By later US patents
- Cut-mask patterning process for fin-like field effect transistor (FinFET) device3,286US 9,236,267 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Illumination device658US 5,296,891 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1994
- Exposure apparatus and method548US 6,341,007 B12002
- Exposure apparatus and method473US 6,590,634 B1Nikon Corporation · 2003
- Multi-chip semiconductor arrangements using flip chip dies446US 5,399,898 ALSI Logic Corporation · 1995