G03F 7/70433
Layout for increasing efficiency or for compensating imaging errors
Official title: {Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors}
G03F7/70433 (Layout for increasing efficiency or for compensating imaging errors) appears on 1,598 US grants and 1,521 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,598
- Published applications
- 1,521
- Assignees
- 321
- Inventors
- 2,546
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 5 | 0 |
| 1993 | 10 | 0 |
| 1994 | 12 | 0 |
| 1995 | 19 | 0 |
| 1996 | 24 | 0 |
| 1997 | 27 | 0 |
| 1998 | 38 | 0 |
| 1999 | 30 | 0 |
| 2000 | 35 | 0 |
| 2001 | 57 | 25 |
| 2002 | 52 | 65 |
| 2003 | 56 | 63 |
| 2004 | 47 | 66 |
| 2005 | 53 | 80 |
| 2006 | 49 | 82 |
| 2007 | 38 | 62 |
| 2008 | 60 | 54 |
| 2009 | 58 | 67 |
| 2010 | 69 | 62 |
| 2011 | 45 | 38 |
| 2012 | 59 | 63 |
| 2013 | 78 | 52 |
| 2014 | 67 | 54 |
| 2015 | 55 | 68 |
| 2016 | 49 | 48 |
| 2017 | 42 | 39 |
| 2018 | 41 | 42 |
| 2019 | 58 | 62 |
| 2020 | 63 | 59 |
| 2021 | 57 | 59 |
| 2022 | 52 | 68 |
| 2023 | 50 | 79 |
| 2024 | 42 | 63 |
| 2025 | 51 | 55 |
| 2026 | 35 | 46 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Optimal scanner maps and field layouts1 Sep 2026US 12,724,353 B2International Business Machines Corporation
- System and method for 3d mask model based on huygens-fresnel principle8 Oct 2026US 2026/0310063 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Curvilinear lithography masks and geometry-based mask check rules for curvilinear lithography masks8 Oct 2026US 2026/0310092 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Operating device and operating method for optical proximity correction8 Oct 2026US 2026/0310093 A1United Microelectronics Corp.
Most cited
By later US patents
- Multi-chip semiconductor arrangements using flip chip dies446US 5,399,898 ALSI Logic Corporation · 1995
- Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process418US 8,887,106 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Mask for photolithography354US 5,242,770 AMicroUnity Systems Engineering, Inc. · 1993
- Optical proximity correction system347US 6,077,310 AKabushiki Kaisha Toshiba · 2000