G03F 7/70441
Optical proximity correction [opc]
Official title: {Optical proximity correction [OPC]}
G03F7/70441 (Optical proximity correction [opc]) appears on 812 US grants and 835 published applications in this corpus.
Search patents in G03F- Granted patents
- 812
- Published applications
- 835
- Assignees
- 178
- Inventors
- 1,324
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 4 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 6 | 0 |
| 1997 | 7 | 0 |
| 1998 | 9 | 0 |
| 1999 | 16 | 0 |
| 2000 | 17 | 0 |
| 2001 | 34 | 14 |
| 2002 | 24 | 34 |
| 2003 | 30 | 26 |
| 2004 | 20 | 32 |
| 2005 | 22 | 37 |
| 2006 | 25 | 44 |
| 2007 | 16 | 20 |
| 2008 | 32 | 21 |
| 2009 | 30 | 24 |
| 2010 | 31 | 32 |
| 2011 | 19 | 24 |
| 2012 | 32 | 31 |
| 2013 | 41 | 33 |
| 2014 | 34 | 27 |
| 2015 | 32 | 36 |
| 2016 | 25 | 20 |
| 2017 | 18 | 20 |
| 2018 | 15 | 23 |
| 2019 | 39 | 38 |
| 2020 | 35 | 32 |
| 2021 | 33 | 40 |
| 2022 | 32 | 47 |
| 2023 | 34 | 57 |
| 2024 | 30 | 47 |
| 2025 | 40 | 41 |
| 2026 | 26 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Mask optimization for first layer that accounts for other layers18 Aug 2026US 12,710,694 B2D2S, Inc.
- System and method for 3d mask model based on huygens-fresnel principle8 Oct 2026US 2026/0310063 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Curvilinear lithography masks and geometry-based mask check rules for curvilinear lithography masks8 Oct 2026US 2026/0310092 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Operating device and operating method for optical proximity correction8 Oct 2026US 2026/0310093 A1United Microelectronics Corp.
Most cited
By later US patents
- Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process418US 8,887,106 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Mask for photolithography354US 5,242,770 AMicroUnity Systems Engineering, Inc. · 1993
- Optical proximity correction system347US 6,077,310 AKabushiki Kaisha Toshiba · 2000
- Performing optical proximity correction with the aid of design rule checkers324US 5,705,301 ALSI Logic Corporation · 1998