Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern
AssigneeASML Netherlands B.V.
InventorsYa LUO, Robert Elliott BOONE, Yen-Wen LU, Rafael C. HOWELL
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Abstract
A method and system for predicting a 2D-element representation of a mask pattern. An input mask pattern corresponding to a target pattern is provided to a prediction model. The prediction model generates a 2D-element representation of an output mask pattern corresponding to the input mask pattern. The 2D-element representation includes multiple 2D elements representing a mask feature of the output mask pattern and each 2D element defines an enclosed area. One or more mask feature contours of the output mask pattern are determined based on the 2D-element representation.
Claims20
A non-transitory computer-readable medium having recorded instructions, the instructions, when executed by a computer system, configured to cause the computer system to at least:
- provide an input mask pattern corresponding to a target pattern to a prediction model;
- generate, using the prediction model, a 2D-element representation of an output mask pattern corresponding to the input mask pattern, wherein the 2D-element representation includes multiple 2D elements representing a mask feature of the output mask pattern and each 2D element defines an enclosed area;
- and
- determine, based on the 2D-element representation, one or more mask feature contours of the output mask pattern for use with a lithography process.
A non-transitory computer-readable medium having recorded instructions, the instructions, when executed by a computer system, configured to cause the computer system to at least:
- obtain a set of input mask patterns and a set of 2D-element representations of a set of output mask patterns corresponding to the set of input mask patterns as training data, wherein a 2D-element representation of the set of 2D-element representations includes multiple 2D elements representing a mask feature of the mask pattern and each 2D element defines an at least partially enclosed area;
- and
- train, using the training data, a prediction model configured to generate, using an input mask pattern, a 2D-element representation for use with a lithography process.
Dependencies are inferred from the claim text.