G03F 7/7045
Hybrid exposures, i.e. multiple exposures of the same area using different types
Official title: {Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam}
G03F7/7045 (Hybrid exposures, i.e. multiple exposures of the same area using different types) appears on 121 US grants and 112 published applications in this corpus.
Search patents in G03F- Granted patents
- 121
- Published applications
- 112
- Assignees
- 79
- Inventors
- 308
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 5 | 0 |
| 2000 | 6 | 0 |
| 2001 | 5 | 0 |
| 2002 | 5 | 6 |
| 2003 | 5 | 6 |
| 2004 | 6 | 3 |
| 2005 | 4 | 6 |
| 2006 | 3 | 6 |
| 2007 | 4 | 2 |
| 2008 | 3 | 6 |
| 2009 | 1 | 9 |
| 2010 | 4 | 3 |
| 2011 | 2 | 2 |
| 2012 | 4 | 1 |
| 2013 | 3 | 6 |
| 2014 | 2 | 4 |
| 2015 | 4 | 3 |
| 2016 | 5 | 2 |
| 2017 | 1 | 7 |
| 2018 | 6 | 8 |
| 2019 | 6 | 4 |
| 2020 | 6 | 3 |
| 2021 | 2 | 3 |
| 2022 | 3 | 6 |
| 2023 | 2 | 5 |
| 2024 | 4 | 4 |
| 2025 | 5 | 5 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods of forming patterns12 May 2026US 12,625,432 B2Tokyo Electron Limited
- Multi charged particle beam writing method and multi charged particle beam writing apparatus21 Apr 2026US 12,609,278 B2NuFlare Technology, Inc.
- Microlithographic fabrication of structures31 Mar 2026US 12,591,174 B2Molecular Imprints, Inc.
- Overlay measurement method, semiconductor device manufacturing method using the same, and overlay measurement apparatus9 Dec 2025US 12,493,246 B2Samsung Electronics Co., Ltd.
- Extreme ultraviolet lithography patterning method9 Dec 2025US 12,494,369 B2Tokyo Electron Limited
- Method for improving throughput of packaging lithography at lower resolutions2 Jul 2026US 2026/0186421 A1Onto Innovation Inc.
- Extreme ultraviolet lithography patterning method19 Mar 2026US 2026/0082871 A1Tokyo Electron Limited
- System and method for selecting photolithography processes9 Oct 2025US 2025/0314972 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor lithography system and/or method18 Sep 2025US 2025/0291257 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist composition and method of manufacturing integrated circuit device using the same8 May 2025US 2025/0149336 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Semiconductor device and a manufacturing method of the same111US 6,709,880 B2Hitachi, Ltd. · 2004
- Lithography system and method of manufacturing devices using the lithography system90US 6,304,318 B1Canon Kabushiki Kaisha · 2001
- Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns52US 6,233,044 B12001
- Exposure method46US 5,498,501 ACanon Kabushiki Kaisha · 1996
- Process for forming both fixed and variable patterns on a single photoresist resin mask44US 5,733,711 AMicron Technology, Inc. · 1998