G03F 7/70458
Mix-and-match, i.e. multiple exposures of the same area using a similar type
Official title: {Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus}
G03F7/70458 (Mix-and-match, i.e. multiple exposures of the same area using a similar type) appears on 120 US grants and 110 published applications in this corpus.
Search patents in G03F- Granted patents
- 120
- Published applications
- 110
- Assignees
- 49
- Inventors
- 240
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 2 |
| 2002 | 6 | 9 |
| 2003 | 2 | 9 |
| 2004 | 6 | 3 |
| 2005 | 7 | 2 |
| 2006 | 3 | 5 |
| 2007 | 4 | 11 |
| 2008 | 4 | 8 |
| 2009 | 4 | 8 |
| 2010 | 8 | 6 |
| 2011 | 3 | 4 |
| 2012 | 6 | 0 |
| 2013 | 6 | 3 |
| 2014 | 5 | 6 |
| 2015 | 3 | 5 |
| 2016 | 2 | 1 |
| 2017 | 0 | 3 |
| 2018 | 4 | 3 |
| 2019 | 3 | 2 |
| 2020 | 4 | 4 |
| 2021 | 1 | 2 |
| 2022 | 3 | 1 |
| 2023 | 3 | 5 |
| 2024 | 2 | 3 |
| 2025 | 2 | 4 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Tool mismatch reduction using aberration map of the tools25 Aug 2026US 12,717,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of correcting overlay, method of controlling semiconductor process, and semiconductor processing apparatus25 Aug 2026US 12,717,247 B2Samsung Electronics Co., Ltd.
- Methods of forming patterns12 May 2026US 12,625,432 B2Tokyo Electron Limited
- Tool mismatch reduction using aberration map of the tools16 Sep 2025US 12,416,864 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Digital lithography scan sequencing7 Jan 2025US 12,189,299 B2APPLIED Materials.Inc.
- Methods and systems for directional processing6 Aug 2026US 2026/0227706 A1Tel Manufacturing and Engineering of America, Inc.
- Optical alignment system and method20 Nov 2025US 2025/0355361 A1ASML Netherlands B. V.
- Tool mismatch reduction using aberration map of the tools16 Oct 2025US 2025/0321498 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Setup and control methods for a lithographic process and associated apparatuses24 Jul 2025US 2025/0237965 A1ASML Netherlands B. V.
- Semiconductor package and method of manufacturing the semiconductor package27 Feb 2025US 2025/0069899 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Mixed exposure for large die163US 11,264,357 B1Invensas Corporation · 2022
- Lithographic apparatus and method for calibrating the same112US 7,256,871 B2ASML Netherlands B. V. · 2007
- Projection exposure apparatus108US 5,117,255 ANikon Corporation · 1992
- Lithographic apparatus and method for calibrating the same106US 7,292,312 B2ASML Netherlands B. V. · 2007
- Method of fabricating semiconductor circuit devices utilizing multiple exposures66US 6,159,644 AHitachi, Ltd. · 2000