Digital lithography scan sequencing

A system comprising:

• a memory;
• and
• at least one processing device operatively coupled to the memory, the at least one processing device to:
• initiate a digital lithography process to pattern a substrate in accordance with instructions;
• perform a first pass of a first exposure unit over a stitching region at an interface of a first scan region of a plurality of scan regions and a second scan region of the plurality of scan regions at a first time;
• and
• perform a second pass of a second exposure unit over the stitching region at a second time that varies from the first time by less than forty seconds.

A method comprising:

• initiating, by a processing device, a digital lithography process to pattern a substrate in accordance with instructions;
• performing a first pass of a first exposure unit over a stitching region at an interface of a first scan region of a plurality of scan regions and a second scan region of the plurality of scan regions at a first time;
• and
• performing a second pass of a second exposure unit over the stitching region at a second time that varies from the first time by less than forty seconds.