G03F 7/70383
Direct write, i.e. pattern is written directly without the use of a
Official title: {Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams (maskless lithography using a programmable mask G03F7/70291)}
G03F7/70383 (Direct write, i.e. pattern is written directly without the use of a) appears on 618 US grants and 614 published applications in this corpus.
Search patents in G03F- Granted patents
- 618
- Published applications
- 614
- Assignees
- 318
- Inventors
- 1,327
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 10 | 0 |
| 1990 | 6 | 0 |
| 1991 | 6 | 0 |
| 1992 | 5 | 0 |
| 1993 | 0 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 3 | 0 |
| 1997 | 9 | 0 |
| 1998 | 16 | 0 |
| 1999 | 14 | 0 |
| 2000 | 13 | 0 |
| 2001 | 26 | 7 |
| 2002 | 25 | 18 |
| 2003 | 15 | 25 |
| 2004 | 22 | 33 |
| 2005 | 14 | 35 |
| 2006 | 30 | 35 |
| 2007 | 19 | 15 |
| 2008 | 17 | 45 |
| 2009 | 22 | 33 |
| 2010 | 25 | 28 |
| 2011 | 17 | 22 |
| 2012 | 17 | 19 |
| 2013 | 23 | 17 |
| 2014 | 20 | 28 |
| 2015 | 17 | 29 |
| 2016 | 27 | 20 |
| 2017 | 28 | 10 |
| 2018 | 16 | 21 |
| 2019 | 15 | 23 |
| 2020 | 18 | 19 |
| 2021 | 25 | 20 |
| 2022 | 12 | 17 |
| 2023 | 10 | 22 |
| 2024 | 17 | 22 |
| 2025 | 12 | 19 |
| 2026 | 13 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Edge placement with spatial light modulator writing1 Sep 2026US 12,724,352 B2Mycronic AB
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Cyclic exposure scanning system having distributed multi-lens and method thereof14 Jul 2026US 12,681,392 B2National Cheng Kung University
- Multi head scanning lithographic laser writer and a method for operating7 Jul 2026US 12,675,049 B2Mycronic AB
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Graphic data generation method, graphic data generation device, quantum beam writing method, quantum beam writing device, and computer-readable recording medium1 Oct 2026US 2026/0299431 A1NuFlare Technology, Inc.
- Stage mechanism, charged particle beam irradiation apparatus, and charged particle beam irradiation method1 Oct 2026US 2026/0299439 A1NuFlare Technology, Inc.
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
- A method for fabricating an optic element17 Sep 2026US 2026/0273878 A1Agency for Science, Technology and Research
- Fabrication method of high-aspect-ratio double-layer diamond nanostructure17 Sep 2026US 2026/0275574 A1Institute of Physics, Chinese Academy of Sciences
Most cited
By later US patents
- High-throughput, maskless lithography system299US 6,177,980 B12001
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004
- Pattern generator236US 6,747,783 B1Micronic Laser Systems AB · 2004
- Laser processing method of semiconductor device using a catalyst221US 5,756,364 ASemiconductor Energy Laboratory Co.Ltd. · 1998
- Laser pattern generation apparatus193US 4,796,038 AAteq · 1989