G03F 7/704
Scanned exposure beam
Official title: {Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358)}
G03F7/704 (Scanned exposure beam) appears on 261 US grants and 188 published applications in this corpus.
Search patents in G03F- Granted patents
- 261
- Published applications
- 188
- Assignees
- 130
- Inventors
- 468
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 8 | 0 |
| 1990 | 3 | 0 |
| 1991 | 5 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 7 | 0 |
| 1998 | 15 | 0 |
| 1999 | 12 | 0 |
| 2000 | 9 | 0 |
| 2001 | 16 | 6 |
| 2002 | 17 | 7 |
| 2003 | 7 | 13 |
| 2004 | 12 | 10 |
| 2005 | 6 | 8 |
| 2006 | 12 | 12 |
| 2007 | 2 | 5 |
| 2008 | 7 | 10 |
| 2009 | 4 | 6 |
| 2010 | 8 | 5 |
| 2011 | 2 | 5 |
| 2012 | 6 | 7 |
| 2013 | 6 | 8 |
| 2014 | 6 | 13 |
| 2015 | 4 | 11 |
| 2016 | 13 | 8 |
| 2017 | 12 | 3 |
| 2018 | 5 | 5 |
| 2019 | 2 | 4 |
| 2020 | 4 | 3 |
| 2021 | 6 | 4 |
| 2022 | 1 | 3 |
| 2023 | 2 | 7 |
| 2024 | 3 | 8 |
| 2025 | 4 | 6 |
| 2026 | 4 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Cyclic exposure scanning system having distributed multi-lens and method thereof14 Jul 2026US 12,681,392 B2National Cheng Kung University
- Multi head scanning lithographic laser writer and a method for operating7 Jul 2026US 12,675,049 B2Mycronic AB
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Fabrication of microscale structures16 Dec 2025US 12,498,643 B2Authentix, Inc.
- Graphic data generation method, graphic data generation device, quantum beam writing method, quantum beam writing device, and computer-readable recording medium1 Oct 2026US 2026/0299431 A1NuFlare Technology, Inc.
- Stage mechanism, charged particle beam irradiation apparatus, and charged particle beam irradiation method1 Oct 2026US 2026/0299439 A1NuFlare Technology, Inc.
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
- Mark position measurement apparatus and mark position measurement method10 Sep 2026US 2026/0266592 A1NuFlare Technology, Inc.
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing circuit board27 Aug 2026US 2026/0251971 A1
Most cited
By later US patents
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004
- Pattern generator236US 6,747,783 B1Micronic Laser Systems AB · 2004
- Laser processing method of semiconductor device using a catalyst221US 5,756,364 ASemiconductor Energy Laboratory Co.Ltd. · 1998
- Laser pattern generation apparatus193US 4,796,038 AAteq · 1989
- Maskless, microlens EUV lithography system148US 6,498,685 B12002