Fabrication method of high-aspect-ratio double-layer diamond nanostructure

A fabrication method of a high-aspect-ratio double-layer diamond nanostructure, comprising:

• performing surface pretreatment on single crystal diamond;
• coating a surface of the pretreated single crystal diamond with two layers of photoresist, and forming two layers of photoresist nanostructure patterns on the surface of the single crystal diamond via electron beam lithography combined with wet etching;
• performing first metal deposition on the surface of the single crystal diamond, stripping an upper layer of photoresist to expose the nanostructure pattern of a lower layer of photoresist, performing second metal deposition on the surface of the single crystal diamond, and stripping the lower layer of photoresist to obtain a pattern having nanostructures of two layers of metal masks;
• and
• carrying out two steps of reactive ion etching on the surface of the single crystal diamond by utilizing the two layers of metal masks, with one-step wet etching conducted between the two steps of reactive ion etching, so as to obtain a target-sized double-layer diamond nanostructure pattern.