G03F 7/708
Construction of apparatus
Official title: {Construction of apparatus, e.g. environment aspects, hygiene aspects or materials}
G03F7/708 (Construction of apparatus) appears on 7,229 US grants and 8,204 published applications in this corpus.
Search patents in G03F- Granted patents
- 7,229
- Published applications
- 8,204
- Assignees
- 757
- Inventors
- 9,635
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 5 | 0 |
| 1981 | 3 | 0 |
| 1982 | 6 | 0 |
| 1983 | 8 | 0 |
| 1984 | 5 | 0 |
| 1985 | 10 | 0 |
| 1986 | 8 | 0 |
| 1987 | 20 | 0 |
| 1988 | 17 | 0 |
| 1989 | 25 | 0 |
| 1990 | 14 | 0 |
| 1991 | 18 | 0 |
| 1992 | 34 | 0 |
| 1993 | 23 | 0 |
| 1994 | 30 | 0 |
| 1995 | 33 | 0 |
| 1996 | 50 | 0 |
| 1997 | 48 | 0 |
| 1998 | 67 | 0 |
| 1999 | 78 | 0 |
| 2000 | 93 | 0 |
| 2001 | 149 | 91 |
| 2002 | 150 | 256 |
| 2003 | 196 | 264 |
| 2004 | 252 | 338 |
| 2005 | 240 | 445 |
| 2006 | 307 | 484 |
| 2007 | 287 | 438 |
| 2008 | 277 | 471 |
| 2009 | 236 | 443 |
| 2010 | 292 | 347 |
| 2011 | 270 | 356 |
| 2012 | 270 | 292 |
| 2013 | 287 | 232 |
| 2014 | 302 | 239 |
| 2015 | 283 | 272 |
| 2016 | 298 | 231 |
| 2017 | 299 | 261 |
| 2018 | 285 | 290 |
| 2019 | 311 | 292 |
| 2020 | 259 | 320 |
| 2021 | 279 | 264 |
| 2022 | 235 | 328 |
| 2023 | 217 | 334 |
| 2024 | 206 | 332 |
| 2025 | 250 | 305 |
| 2026 | 191 | 279 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70858Environment aspects2,868
- G03F 7/70908Hygiene2,098
- G03F 7/70808Construction details1,541
- G03F 7/7085Detection arrangement1,183
- G03F 7/7095Materials894
- G03F 7/70983Optical system protection464
- G03F 7/70991Connection with other apparatus430
- G03F 7/70975Assembly, maintenance, transport or storage of apparatus305
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Screw transmission drive, and reticle stage and measuring device for semiconductor lithography applications6 Oct 2026US 12,754,486 B2Carl Zeiss SMT GmbH
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same29 Sep 2026US 12,747,890 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same8 Oct 2026US 2026/0309362 A1Samsung Electronics Co., Ltd.
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Novel design of an inspection tool for an extreme ultraviolet radiation source to observe tin residual8 Oct 2026US 2026/0310098 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999