G03F 7/7085
Detection arrangement
Official title: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load}
G03F7/7085 (Detection arrangement) appears on 1,183 US grants and 1,539 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,183
- Published applications
- 1,539
- Assignees
- 178
- Inventors
- 2,432
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 4 | 3 |
| 2002 | 3 | 6 |
| 2003 | 2 | 8 |
| 2004 | 8 | 26 |
| 2005 | 16 | 27 |
| 2006 | 20 | 49 |
| 2007 | 26 | 52 |
| 2008 | 26 | 73 |
| 2009 | 39 | 92 |
| 2010 | 28 | 69 |
| 2011 | 50 | 81 |
| 2012 | 64 | 50 |
| 2013 | 64 | 48 |
| 2014 | 60 | 43 |
| 2015 | 61 | 53 |
| 2016 | 62 | 40 |
| 2017 | 55 | 51 |
| 2018 | 71 | 85 |
| 2019 | 86 | 78 |
| 2020 | 60 | 80 |
| 2021 | 77 | 71 |
| 2022 | 61 | 96 |
| 2023 | 66 | 84 |
| 2024 | 54 | 87 |
| 2025 | 59 | 92 |
| 2026 | 50 | 95 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
- System for and method of calibrating measurement of duv laser beam spectral properties8 Oct 2026US 2026/0310102 A1Cymer, Inc.
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Most cited
By later US patents
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Lithographic apparatus and device manufacturing method298US 7,199,858 B2ASML Netherlands B. V. · 2007
- Lithographic apparatus and device manufacturing method282US 7,075,616 B2ASML Netherlands B. V. · 2006
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Lithographic apparatus and device manufacturing method171US 7,081,943 B2ASML Netherlands B. V. · 2006