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US 7,081,943 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJoeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman
Life of this patent
Estimating the term…
Abstract
In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
Claims51
A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of a substrate;
- and
- a liquid supply system configured to at least partly fill a space between said projection system and a substrate, with a liquid through which said beam is to be projected, said liquid supply system comprising:
- a liquid confinement structure configured to extend along at least a part of the boundary of said space, configured to remain substantially stationary in a plane substantially parallel to a surface of the substrate and having an inlet configured to supply liquid onto the substrate;
- and
- a seal between said structure and a surface of a substrate.
5 more elements
An immersion lithographic projection apparatus, comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid confinement structure configured to extend along at least part of the boundary of a localized space on the surface of a substrate, said space configured to contain a liquid through which said beam is to be projected and said structure configured to substantially seal at least part of said space,
- wherein liquid would be substantially prevented from flowing across a portion of a surface of a substrate located outside of the localized space.
3 more elements
A device manufacturing method comprising:
- providing a liquid to fill a space between a substrate and a projection system, a liquid confinement structure extending along at least a part of the boundary of said space;
- forming a gas seal between said structure and the surface of said substrate;
- and
- projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate.
1 more element
An immersion lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate and movable in a scanning direction;
- a projection system configured to project the patterned beam onto a target portion of a substrate using a scanning exposure;
- a liquid confinement structure configured to substantially seal at least part of a space bounded by a surface of a substrate and the periphery of a localized portion of said surface;
- and
- a liquid inlet to provide a liquid, through which said beam is to be projected, to said space,
- wherein liquid would be substantially prevented from flowing across a portion of a surface of a substrate located outside of the space.
4 more elements
A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate and movable in a scanning direction;
- a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
- a liquid confinement structure having an aperture having a cross-sectional area smaller than a surface area of a substrate;
- a seal between said structure and a substrate;
- and
- a liquid inlet to provide a liquid, through which said beam is to be projected, to said aperture.
4 more elements
An immersion lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid confinement structure that can substantially confine all of a liquid provided to an area of a radiation-sensitive surface of a substrate under said projection system, said area being smaller than the entire area of said substrate surface;
- and
- a liquid inlet to provide a liquid to said area and between said projection system and said substrate surface.
3 more elements
Dependencies are inferred from the claim text.