Lithographic apparatus and device manufacturing method

A lithographic projection apparatus comprising:

• a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• a liquid supply system configured to provide an immersion liquid, through which said beam is to be projected, in a space between said projection system and said substrate;
• and
• a shutter configured to keep said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.