G03F 7/70983
Optical system protection
Official title: {Optical system protection, e.g. pellicles or removable covers for protection of mask}
G03F7/70983 (Optical system protection) appears on 464 US grants and 569 published applications in this corpus.
Search patents in G03F- Granted patents
- 464
- Published applications
- 569
- Assignees
- 139
- Inventors
- 1,230
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 12 | 5 |
| 2002 | 8 | 19 |
| 2003 | 19 | 21 |
| 2004 | 28 | 35 |
| 2005 | 16 | 33 |
| 2006 | 23 | 31 |
| 2007 | 22 | 22 |
| 2008 | 20 | 16 |
| 2009 | 13 | 20 |
| 2010 | 18 | 16 |
| 2011 | 15 | 26 |
| 2012 | 15 | 15 |
| 2013 | 12 | 4 |
| 2014 | 10 | 12 |
| 2015 | 11 | 6 |
| 2016 | 11 | 12 |
| 2017 | 8 | 9 |
| 2018 | 7 | 24 |
| 2019 | 15 | 26 |
| 2020 | 34 | 37 |
| 2021 | 31 | 29 |
| 2022 | 25 | 33 |
| 2023 | 20 | 34 |
| 2024 | 16 | 28 |
| 2025 | 28 | 33 |
| 2026 | 10 | 23 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Pellicle holding module, pellicle thermal durability evaluation device comprising same, and pellicle thermal durability evaluation method25 Aug 2026US 12,717,226 B2Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
- Apparatus for and method of reducing contamination from source material in an EUV light source18 Aug 2026US 12,713,511 B2ASML Netherlands B. V.
- Laser lithography device and method for producing a three-dimensional structure4 Aug 2026US 12,699,329 B2Nanoscribe Holding GmbH
- Lithography system and methods21 Jul 2026US 12,687,785 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Pellicle, exposure master, exposure device, pellicle production method and test method for mask adhesive layer14 Jul 2026US 12,681,381 B2Mitsui Chemicals, Inc.
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Pellicle frame, pellicle, and exposure plate with pellicle, and method for producing pellicle frame, exposure method, method for producing semiconductor device, and method for producing liquid-crystal display panel24 Sep 2026US 2026/0287996 A1Nippon Light Metal Company, Ltd.
- Lithography apparatus and method for operating the same24 Sep 2026US 2026/0288022 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv pellicle with structured ventilation frame10 Sep 2026US 2026/0267220 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
Most cited
By later US patents
- Gradient immersion lithography220US 6,954,256 B2ASML Netherlands B. V. · 2005
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors133US 5,581,324 ANikon Corporation · 1996
- High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices115US 6,891,655 B2Micronic Laser Systems AB · 2005
- Configurations, materials and wavelengths for EUV lithium plasma discharge lamps76US 5,963,616 AUniversity of Central Florida · 1999