Pellicle, exposure master, exposure device, pellicle production method and test method for mask adhesive layer

A method for the production of a pellicle comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

• when an attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask for 2 minutes and the pellicle is then peeled off, a residual ratio of the adhesive layer represented as a ratio of residual area of the adhesive layer on the mask to area of the attachment portion of the adhesive layer is 0.001 to 5.0%,
• the adhesive layer comprises:
• a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,
• the crosslinking density-ensuring unit contains three or more isocyanate groups, and
• the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.

A test method of an adhesive layer for a mask, using a pellicle comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

• acceptability of the adhesive layer is determined by whether or not a residual ratio of the adhesive layer represented by a ratio of residual area of the adhesive layer on a quartz mask/area of an attachment portion of the adhesive layer to the mask is within a range of 0.001% to 5.0%,
• the adhesive layer comprises:
• a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,
• the crosslinking density-ensuring unit contains three or more isocyanate groups, and
• the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.

A pellicle, comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

• when an attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask at a cumulative radiation dose of 6.0 J/cm2 and the pellicle is then peeled off, a residual ratio of the adhesive layer represented as a ratio of residual area of the adhesive layer on the mask/area of the attachment portion of the adhesive layer is 0.001 to 5.0%,
• the adhesive layer comprises:
• a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,
• the crosslinking density-ensuring unit contains three or more isocyanate groups, and
• the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.