Euv pellicle with structured ventilation frame

A reticle structure, comprising:

• a reticle having patterned features;
• a membrane including a border layer disposed over a first border section of the membrane and a middle section enclosed by the first border section;
• and
• a frame disposed between the membrane and the reticle and configured to mount the membrane over the patterned features of the reticle, wherein the frame encircles the patterned features and produces an enclosure between the reticle and the membrane, wherein the frame comprises a plurality of holes with different shapes at an outer surface of the frame and extending through the frame, wherein a number of the plurality of holes are more than a threshold number of holes to maintain an equalized pressure difference between the enclosure and outside the enclosure below a threshold pressure, and wherein at least one of the holes is a first slit-shaped hole that has one side formed by the border layer of the membrane and three other sides formed by the frame, and at least one of the holes is a second slit-shaped hole that has one side formed by the reticle and three other sides formed by the frame.

A reticle structure, comprising:

• a reticle having patterned features;
• a membrane having a border section and a middle section enclosed by the border section, wherein a border layer is formed on the border section;
• and
• a frame disposed and forming an enclosure between the reticle and the membrane to encircle the patterned features, wherein the frame comprises a plurality of holes with different shapes at an outer surface of the frame, the plurality of holes extend through the frame and include at least one first slit-shaped hole having one side formed by the reticle and three sides formed by the frame and at least one second slit-shaped hole having one side formed by the border layer and three sides formed by the frame.