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US 12,713,511 B2Granted
Apparatus for and method of reducing contamination from source material in an EUV light source
AssigneeASML Netherlands B.V.
InventorsYue Ma, Dzmitry Labetski, Andrew David LaForge
Life of this patent
Estimating the term…
Abstract
Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.
Claims20
Apparatus for generating EUV radiation, the apparatus comprising:
- a vessel;
- a collector mirror positioned within the vessel, wherein the collector mirror has a first focal point and a second focal point, the first focal point being located between the collector mirror and the second focal point;
- an exhaust port positioned in a side wall of the vessel to remove an oxygen gas from the vessel prior to the oxygen gas reaching the first focal point;
- and
- at least one inlet adapted to be placed in fluid communication with a source of the oxygen gas and positioned in the side wall in a region between the exhaust port and the second focal point.
2 more elements
Apparatus for generating EUV radiation, the apparatus comprising:
- a vessel;
- a collector mirror positioned within the vessel, the collector mirror having a primary focus;
- at least one exhaust port positioned in a side wall of the vessel to remove an oxygen gas from the vessel prior to the oxygen gas reaching the primary focus;
- and
- at least one inlet adapted to be placed in fluid communication with a source of the oxygen gas and positioned in the side wall closer to the at least one exhaust port than to the primary focus.
2 more elements
Apparatus for generating EUV radiation, the apparatus comprising:
- a vessel;
- a collector mirror positioned within the vessel, wherein the collector mirror has a first focal point within the vessel where target material may be irradiated to produce plasma and a second focal point, the first focal point being located between the collector mirror and the second focal point;
- an exhaust port positioned in a side wall of the vessel;
- and
- at least one inlet adapted to be placed in fluid communication with a source of oxygen gas and positioned in the side wall in a region between the exhaust port and the second focal point.
2 more elements
Dependencies are inferred from the claim text.