Pellicle frame, pellicle, and exposure plate with pellicle, and method for producing pellicle frame, exposure method, method for producing semiconductor device, and method for producing liquid-crystal display panel
AssigneesShin-Etsu Chemical Co., Ltd., Nippon Light Metal Company, Ltd.
InventorsYu YANASE, Takeshi OSHIMA, Koichi NAKANO
Life of this patent
Estimating the term…
Abstract
A pellicle frame to be included in a pellicle for photolithography, wherein the pellicle frame is made of pure titanium or a titanium alloy, and has a surface subjected to: a mechanically polishing treatment; an electrolytic degreasing treatment; and a chemically polishing treatment. This provides a pellicle frame with reduced fine dust particles remaining on the surface, and a method for producing a pellicle frame.
Claims20
1-13. (canceled)
A pellicle frame to be included in a pellicle for photolithography, wherein
- the pellicle frame is made of pure titanium or a titanium alloy, and has a surface subjected to:
- a mechanically polishing treatment;
- an electrolytic degreasing treatment;
- and
- a chemically polishing treatment.
A method for producing a pellicle frame to be included in a pellicle for photolithography, wherein the pellicle frame is produced by subjecting a surface of a pellicle frame made of pure titanium or a titanium alloy to:
- a mechanically polishing treatment;
- an electrolytic degreasing treatment;
- and
- a chemically polishing treatment.
Dependencies are inferred from the claim text.