Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
AssigneeUniversity of Central Florida
InventorsWilliam T. Silfvast, Marc A. Klosner
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Abstract
This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.
Claims17
A lithium discharge source using a segmented insulating bore, comprising:
- lithium vapor;
- means for forming a conductor region;
- and
- a segmented insulating bore for supporting the conductor region means and the lithium vapor therebetween, wherein a lithium plasma discharge source is generated along the conductor region means within the segmented insulating bore.
A method of radiating a Lithium ion plasma source at approximately 11.4 nm comprising the steps of:
- forming a plasma source substantially composed of Li.sup.2+ ions;
- and
- radiating the plasma source at approximately 11.4 nm.
A lithium discharge source comprising:
- lithium vapor;
- metal electrodes;
- a ceramic insulator for housing the lithium vapor, wherein a lithium plasma discharge source is generated in a bore through the insulator between the electrodes.
A closed loop cycle circulation path system for a lithium discharge source, comprising:
- a electrode casing;
- a lithium source within the electrode casing;
- an insulating bore within the electrode casing forming a discharge bore for the lithium source, the discharge bore having a first electrical impedance;
- and
- a return path through a region of a second electrical impedance, the second electrical impedance having a higher impedance than the first electrical impedance, wherein a lithium plasma is generated between the electrode casing within the insulating bore.
Dependencies are inferred from the claim text.