G03F 7/7095
Materials
Official title: {Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient}
G03F7/7095 (Materials) appears on 894 US grants and 1,137 published applications in this corpus.
Search patents in G03F- Granted patents
- 894
- Published applications
- 1,137
- Assignees
- 148
- Inventors
- 1,698
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 8 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 9 | 0 |
| 2001 | 12 | 10 |
| 2002 | 18 | 30 |
| 2003 | 26 | 59 |
| 2004 | 48 | 60 |
| 2005 | 29 | 89 |
| 2006 | 55 | 89 |
| 2007 | 45 | 71 |
| 2008 | 42 | 75 |
| 2009 | 37 | 65 |
| 2010 | 53 | 48 |
| 2011 | 46 | 49 |
| 2012 | 42 | 43 |
| 2013 | 45 | 27 |
| 2014 | 35 | 39 |
| 2015 | 36 | 27 |
| 2016 | 43 | 32 |
| 2017 | 31 | 34 |
| 2018 | 31 | 29 |
| 2019 | 31 | 41 |
| 2020 | 34 | 27 |
| 2021 | 33 | 26 |
| 2022 | 18 | 24 |
| 2023 | 21 | 29 |
| 2024 | 15 | 29 |
| 2025 | 17 | 42 |
| 2026 | 18 | 43 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Screw transmission drive, and reticle stage and measuring device for semiconductor lithography applications6 Oct 2026US 12,754,486 B2Carl Zeiss SMT GmbH
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Laser lithography device and method for producing a three-dimensional structure4 Aug 2026US 12,699,329 B2Nanoscribe Holding GmbH
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Method and apparatus for deposition of at least one layer, optical element and optical arrangement28 Jul 2026US 12,692,603 B2Carl Zeiss SMT GmbH
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Object holder, object table, method of controlling the shape of a surface, method of manufacturing the object holder, and their use in a lithographic method or apparatus1 Oct 2026US 2026/0299440 A1ASML Netherlands B. V.
- Protective device for a vacuum seal1 Oct 2026US 2026/0299441 A1ASML Netherlands B. V.
- Conductive polymers for reticle table cleaning apparatus24 Sep 2026US 2026/0288021 A1ASML Netherlands B. V.
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
Most cited
By later US patents
- High-resolution spatial light modulator for 3-dimensional holographic display302US 6,819,469 B12004
- Gradient immersion lithography220US 6,954,256 B2ASML Netherlands B. V. · 2005
- Refractive projection objective with a waist106US 6,891,683 B2Carl Zeiss SMT GmbH · 2005
- Exposure apparatus and method for producing device86US 7,388,649 B2Nikon Corporation · 2008
- Very-high aperture projection objective83US 7,154,676 B2Carl Zeiss SMT GmbH · 2006