G03F 7/70958
Optical materials or coatings
Official title: {Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties}
G03F7/70958 (Optical materials or coatings) appears on 716 US grants and 895 published applications in this corpus.
Search patents in G03F- Granted patents
- 716
- Published applications
- 895
- Assignees
- 130
- Inventors
- 1,231
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 8 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 9 | 0 |
| 2001 | 12 | 10 |
| 2002 | 17 | 29 |
| 2003 | 25 | 58 |
| 2004 | 46 | 56 |
| 2005 | 28 | 76 |
| 2006 | 46 | 76 |
| 2007 | 38 | 55 |
| 2008 | 37 | 67 |
| 2009 | 30 | 53 |
| 2010 | 46 | 42 |
| 2011 | 35 | 36 |
| 2012 | 38 | 35 |
| 2013 | 37 | 25 |
| 2014 | 21 | 29 |
| 2015 | 27 | 17 |
| 2016 | 32 | 27 |
| 2017 | 23 | 20 |
| 2018 | 19 | 20 |
| 2019 | 20 | 30 |
| 2020 | 26 | 22 |
| 2021 | 23 | 18 |
| 2022 | 16 | 15 |
| 2023 | 13 | 20 |
| 2024 | 10 | 12 |
| 2025 | 13 | 26 |
| 2026 | 6 | 21 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Laser lithography device and method for producing a three-dimensional structure4 Aug 2026US 12,699,329 B2Nanoscribe Holding GmbH
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Method and apparatus for deposition of at least one layer, optical element and optical arrangement28 Jul 2026US 12,692,603 B2Carl Zeiss SMT GmbH
- Temperature measurement of optical elements in an optical apparatus2 Jun 2026US 12,645,147 B2ASML Netherlands B. V.
- Coloring composition, film, optical filter, solid-state imaging element, image display device, and compound20 Jan 2026US 12,529,969 B2FUJIFILM Corporation
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Method for producing an optical system for a lithography apparatus, substrate for an optical component of a lithography apparatus, and lithography apparatus30 Jul 2026US 2026/0216920 A1Carl Zeiss SMT GmbH
- Projection exposure apparatus comprising an element comprising an elastic material23 Jul 2026US 2026/0211342 A1Carl Zeiss SMT GmbH
- Improved reticle and reticle blank2 Jul 2026US 2026/0186400 A1ASML Netherlands B. V.
Most cited
By later US patents
- High-resolution spatial light modulator for 3-dimensional holographic display302US 6,819,469 B12004
- Gradient immersion lithography220US 6,954,256 B2ASML Netherlands B. V. · 2005
- Refractive projection objective with a waist106US 6,891,683 B2Carl Zeiss SMT GmbH · 2005
- Exposure apparatus and method for producing device86US 7,388,649 B2Nikon Corporation · 2008
- Very-high aperture projection objective83US 7,154,676 B2Carl Zeiss SMT GmbH · 2006