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US 2026/0211342 A1Published application
Projection exposure apparatus comprising an element comprising an elastic material
AssigneeCarl Zeiss SMT GmbH
InventorJulian KALLER
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Abstract
A projection exposure apparatus (1, 101) for semiconductor lithography includes an element (40, 50, 70, 90, 120, 140) with an elastic material. The element (40, 50, 70, 90, 120, 140) has a core region (48, 58, 78, 98, 128, 148) having the elastic material and a cladding region (49, 59, 79, 99, 129, 149) at least partly surrounding the core region. The cladding region (49, 59, 79, 99, 129, 149) has at least one barrier layer (81, 141, 143) and the core region (48, 58, 78, 98, 128, 148) has an elastomer and/or a thermoplastic.
Claims19
A projection exposure apparatus for semiconductor lithography comprising:
- a first component and a second component, and
- an element arranged in an assembly configured as an end stop between the components and comprising a core region comprising an elastic material and a cladding region at least partly surrounding the core region, wherein:
- the cladding region comprises at least one barrier layer,
- the core region comprises an elastomer and/or a thermoplastic, and
- the core region and the cladding region are interconnected arealy.
2 more elements
Dependencies are inferred from the claim text.