G03F 7/70966
Birefringence
Official title: {Birefringence}
G03F7/70966 (Birefringence) appears on 149 US grants and 192 published applications in this corpus.
Search patents in G03F- Granted patents
- 149
- Published applications
- 192
- Assignees
- 30
- Inventors
- 198
- Latest grant
- 20 Feb 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 7 |
| 2003 | 1 | 22 |
| 2004 | 18 | 25 |
| 2005 | 13 | 26 |
| 2006 | 18 | 21 |
| 2007 | 13 | 17 |
| 2008 | 15 | 24 |
| 2009 | 8 | 12 |
| 2010 | 10 | 8 |
| 2011 | 10 | 4 |
| 2012 | 9 | 2 |
| 2013 | 7 | 3 |
| 2014 | 2 | 2 |
| 2015 | 5 | 5 |
| 2016 | 6 | 2 |
| 2017 | 3 | 3 |
| 2018 | 1 | 1 |
| 2019 | 0 | 2 |
| 2020 | 0 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 0 |
| 2023 | 0 | 1 |
| 2024 | 1 | 1 |
| 2025 | 0 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Optical system in particular for microlithography20 Feb 2024US 11,906,753 B2Carl Zeiss SMT GmbH
- Hydroxide-catalysis bonding of optical components used in DUV optical systems24 May 2022US 11,340,383 B2Corning Incorporated
- Reflective optical element and optical system for EUV lithography having proportions of substances which differ across a surface27 Jul 2021US 11,073,766 B2Carl Zeiss SMT GmbH
- Illumination system of a microlithographic projection exposure apparatus with a birefringent element11 Dec 2018US 10,151,982 B2Carl Zeiss SMT GmbH
- Illumination optical apparatus and projection exposure apparatus12 Sep 2017US 9,760,014 B2Nikon Corporation
- Photolithography apparatus and method of operating the same27 Nov 2025US 2025/0362622 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photolithography apparatus and method of operating the same27 Nov 2025US 2025/0362623 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method of producing an optical element for a lithography apparatus25 Jan 2024US 2024/0025003 A1
- Optical apparatus and lithographic apparatus using the optical apparatus15 Jun 2023US 2023/0185204 A1ASML Holding N. V.
- Optical system in particular for microlithography29 Jul 2021US 2021/0231965 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Gradient immersion lithography220US 6,954,256 B2ASML Netherlands B. V. · 2005
- Projection optical system, production method thereof, and projection exposure apparatus using it72US 6,583,931 B2Nikon Corporation · 2003
- Projection optical system, production method thereof, and projection exposure apparatus using it69US 6,366,404 B1Nikon Corporation · 2002
- Objective with fluoride crystal lenses62US 7,145,720 B2Carl Zeiss SMT GmbH · 2006
- Optical reduction system with control of illumination polarization61US 6,680,798 B2ASML Holding N. V. · 2004