Back to results
US 11,906,753 B2Granted
Optical system in particular for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorJohannes Kraus
Life of this patent
Estimating the term…
Abstract
An optical system, in particular for microlithography, includes a beam splitter, which has at least one light entry surface. The beam splitter is arranged in the optical system so that the angles of incidence with respect to the surface normal which occur at the light entry surface during operation of the optical system lie in the range of 45°±5°. The beam splitter is produced in [110] the crystal cut.
Claims20
An optical system, comprising:
- a beam splitter comprising a light entry surface having a surface normal, wherein:
- the beam splitter is arranged in the optical system so that, during use of the optical system, angles of incidence with respect to the surface normal lie in a range of 45°±5°;
- and
- the beam splitter is produced in the [110] crystal cut.
1 more element
An optical pulse stretcher, comprising:
- a plurality of mirrors;
- and
- a beam splitter comprising a light entry surface having a surface normal, wherein:
- the beam splitter is arranged in the optical pulse stretcher so that, during use of the optical pulse stretcher, angles of incidence with respect to the surface normal lie in a range of 45°±5°;
- and
- the beam splitter is produced in the [110] crystal cut.
3 more elements
A laser light source, comprising:
- an optical pulse stretcher, comprising:
- a plurality of mirrors;
- and
- a beam splitter comprising a light entry surface having a surface normal, wherein:
- the beam splitter is arranged in the optical pulse stretcher so that, during use of the optical laser light source, angles of incidence with respect to the surface normal lie in a range of 45°±5°;
- and
- the beam splitter is produced in the [110] crystal cut.
4 more elements
Dependencies are inferred from the claim text.