Method and apparatus for deposition of at least one layer, optical element and optical arrangement
AssigneeCarl Zeiss SMT GmbH
InventorsFelix Lange, Alexandra Pazidis, Marcel Haertling, Alexander Wiegand
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Abstract
The disclosed techniques relate to a method for depositing at least one layer composed of an ionically bonded solid on a substrate, comprising the following steps: converting a coating material to the gas phase and depositing the coating material converted to the gas phase on the substrate. The layer is irradiated with UV/VIS light during the deposition. The disclosed techniques also relate to an apparatus for implementing the disclosed method and optical elements and devices created using the disclosed method.
Claims12
A method for depositing by physical vapor deposition at least one layer composed of an ionically bonded solid on a substrate, comprising:
- converting a coating material to a gas phase;
- depositing the coating material converted to the gas phase on the substrate forming the ionically bonded solid on the substrate;
- and
- irradiating the coating material converted to the gas phase with UV/VIS light during the depositing, wherein the UV/VIS light comprises a first spectral range for annealing at least one crystal defect of the ionically bonded solid by removing electrons from the crystal defects,
- wherein the first spectral range at least partly overlaps an absorption range of the at least one crystal defect, wherein the first spectral range comprises an absorption energy of the at least one crystal defect, and
- wherein a mean energy of the first spectral range deviates from the absorption energy of the at least one crystal defect by 0.5 eV or less, and wherein the UV/VIS light comprises a second spectral range for mobilizing atoms at a surface of the ionically bonded solid, the second spectral range lying in an energy range of between 75% and 100% of a bandgap energy of the ionically bonded solid.
Dependencies are inferred from the claim text.