G03F 7/70908
Hygiene
Official title: {Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus}
G03F7/70908 (Hygiene) appears on 2,098 US grants and 2,504 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,098
- Published applications
- 2,504
- Assignees
- 302
- Inventors
- 3,769
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 7 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 3 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 11 | 0 |
| 1997 | 7 | 0 |
| 1998 | 4 | 0 |
| 1999 | 9 | 0 |
| 2000 | 11 | 0 |
| 2001 | 28 | 30 |
| 2002 | 29 | 86 |
| 2003 | 57 | 68 |
| 2004 | 79 | 99 |
| 2005 | 77 | 142 |
| 2006 | 109 | 149 |
| 2007 | 87 | 145 |
| 2008 | 95 | 145 |
| 2009 | 75 | 127 |
| 2010 | 95 | 105 |
| 2011 | 82 | 117 |
| 2012 | 78 | 86 |
| 2013 | 85 | 58 |
| 2014 | 90 | 63 |
| 2015 | 73 | 66 |
| 2016 | 68 | 61 |
| 2017 | 71 | 71 |
| 2018 | 71 | 51 |
| 2019 | 74 | 70 |
| 2020 | 71 | 128 |
| 2021 | 100 | 95 |
| 2022 | 92 | 131 |
| 2023 | 90 | 134 |
| 2024 | 88 | 107 |
| 2025 | 108 | 99 |
| 2026 | 55 | 71 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Cleaning structure surface in light source chamber1 Oct 2026US 2026/0299442 A1ASML Netherlands B. V.
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Conductive polymers for reticle table cleaning apparatus24 Sep 2026US 2026/0288021 A1ASML Netherlands B. V.
- Lithography apparatus and method for operating the same24 Sep 2026US 2026/0288022 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Surface-treated shower head for use in a substrate processing chamber584US 6,182,603 B2Applied Komatsu Technology, Inc. · 2001
- Exposure apparatus, exposure method, and device manufacturing method560US 6,633,364 B2Nikon Corporation · 2003
- System for detecting base contaminants in air504US 6,096,267 AExtraction Systems, Inc. · 2000
- Lithographic apparatus and device manufacturing method282US 7,075,616 B2ASML Netherlands B. V. · 2006
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007