G03F 7/70925
Cleaning, i.e. actively freeing apparatus from pollutants
Official title: {Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning}
G03F7/70925 (Cleaning, i.e. actively freeing apparatus from pollutants) appears on 661 US grants and 857 published applications in this corpus.
Search patents in G03F- Granted patents
- 661
- Published applications
- 857
- Assignees
- 136
- Inventors
- 1,517
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 3 | 0 |
| 2001 | 10 | 11 |
| 2002 | 7 | 10 |
| 2003 | 12 | 11 |
| 2004 | 11 | 16 |
| 2005 | 7 | 19 |
| 2006 | 20 | 36 |
| 2007 | 8 | 50 |
| 2008 | 27 | 52 |
| 2009 | 17 | 57 |
| 2010 | 31 | 39 |
| 2011 | 29 | 39 |
| 2012 | 27 | 33 |
| 2013 | 23 | 15 |
| 2014 | 36 | 24 |
| 2015 | 23 | 27 |
| 2016 | 13 | 14 |
| 2017 | 26 | 20 |
| 2018 | 21 | 15 |
| 2019 | 23 | 24 |
| 2020 | 26 | 55 |
| 2021 | 48 | 40 |
| 2022 | 40 | 65 |
| 2023 | 37 | 53 |
| 2024 | 44 | 59 |
| 2025 | 51 | 40 |
| 2026 | 29 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Solution treatment apparatus and cleaning method22 Sep 2026US 12,743,033 B2Tokyo Electron Limited
- Method of operating semiconductor apparatus25 Aug 2026US 12,717,242 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Mitigating long-term energy decay of laser devices11 Aug 2026US 12,704,792 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Utility stage for photolithographic apparatus and method4 Aug 2026US 12,699,328 B2ASML Netherlands B. V.
- Cleaning structure surface in light source chamber1 Oct 2026US 2026/0299442 A1ASML Netherlands B. V.
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Conductive polymers for reticle table cleaning apparatus24 Sep 2026US 2026/0288021 A1ASML Netherlands B. V.
- Dry chamber clean of photoresist films10 Sep 2026US 2026/0269199 A1Lam Research Corporation
- A pellicle cleaning system27 Aug 2026US 2026/0251987 A1ASML Netherlands B. V.
Most cited
By later US patents
- Surface-treated shower head for use in a substrate processing chamber584US 6,182,603 B2Applied Komatsu Technology, Inc. · 2001
- Projection exposure apparatus and method172US 6,496,257 B1Nikon Corporation · 2002
- Removal of surface contaminants by irradiation from a high-energy source105US 5,024,968 A1991
- Removal of material by polarized radiation92US 5,958,268 ACauldron Limited Partnership · 1999
- Exposure apparatus and method for producing device86US 7,388,649 B2Nikon Corporation · 2008