Solution treatment apparatus and cleaning method

A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate,

• the solution treatment apparatus comprising:
• a holder configured to hold and rotate the substrate;
• a coating solution supplier configured to supply the coating solution to the substrate held on the holder;
• and
• an inner cup configured to surround the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate held on the holder,
• the solution treatment apparatus comprising:
• a plurality of discharge ports formed along a circumferential direction at the apex part;
• a storage chamber provided in a circular shape along the circumferential direction inside the inner cup, communicating with each of the plurality of discharge ports, and configured to store the cleaning solution;
• and
• an introduction hole connected to the storage chamber and configured to introduce the cleaning solution to the storage chamber;
• the cleaning method comprising
• introducing the cleaning solution to the storage chamber via the introduction hole,
• discharging the cleaning solution from the plurality of discharge ports and making the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning away the coating solution adhering to the peripheral edge side upper surface,
• the discharging in the cleaning discharges the cleaning solution from the plurality of discharge ports outward in the radial direction and obliquely upward,
• wherein, in the solution treatment apparatus, for each discharge port of the plurality of discharge ports, a thickness of a flow path constituting each discharge port is larger as a respective distance from each discharge port to the introduction hole is longer.

A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate,

• the solution treatment apparatus comprising:
• a holder configured to hold and rotate the substrate;
• a coating solution supplier configured to supply the coating solution to the substrate held on the holder;
• and
• an inner cup configured to surround the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate held on the holder,
• the solution treatment apparatus comprising:
• a plurality of discharge ports formed along a circumferential direction at the apex part;
• a storage chamber provided in a circular shape along the circumferential direction inside the inner cup, communicating with each of the plurality of discharge ports, and configured to store the cleaning solution;
• and
• an introduction hole connected to the storage chamber and configured to introduce the cleaning solution to the storage chamber;
• the cleaning method comprising
• introducing the cleaning solution to the storage chamber via the introduction hole,
• discharging the cleaning solution from the plurality of discharge ports and making the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning away the coating solution adhering to the peripheral edge side upper surface,
• the discharging in the cleaning discharges the cleaning solution from the plurality of discharge ports outward in the radial direction and obliquely upward,
• wherein, in the solution treatment apparatus, a respective obliquely upward discharge angle of the cleaning solution from the plurality of discharge ports at the discharging in the cleaning is larger as a respective distance from the plurality of discharge ports to the introduction hole is longer.