Projection exposure apparatus and method

A projection exposure apparatus for transferring a pattern defined on a mask onto a substrate via a projection optical system, comprising:

• a cleaning device that cleans an optical member disposed at a given position,
• wherein the cleaning device is mounted on a vertical movement drive device provided on the stage.

A projection exposure apparatus for transferring a pattern defined on a mask onto a substrate via a projection optical system, comprising:

• a cleaning device that cleans an optical member disposed at a given position,
• wherein the cleaning device is disposed on a stage for holding the substrate, and the cleaning device comprises an optical cleaning device that irradiates an irradiation light having an optically cleaning effect onto the surface of the optical member.

A projection exposure method for transferring a pattern defined on a mask onto a substrate via a projection optical system, the method comprising:

• cleaning contamination from an optical member using a cleaning device disposed on a stage holding the substrate;
• and
• transferring the pattern defined on the mask onto the substrate via the projection optical system.

A method for making a projection exposure apparatus for transferring a pattern defined on a mask onto the substrate via a projection optical system, the method comprising:

• providing a stage holding the substrate with a cleaning device configured to clean an optical member as a part of the projection exposure apparatus.

A method for assembling a projection exposure for transferring a pattern defined on a mask to a substrate via a projection optical system, the method comprising:

• providing a cleaning device that cleans an optical member as a part of the projection exposure apparatus,
• wherein the cleaning device is an optical cleaning device that irradiates an irradiation light having an optical cleaning effect onto contamination on the optical member and is disposed on a stage for holding the substrate.