Utility stage for photolithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsKeane Michael Levy, Amy Ng
Life of this patent
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Abstract
Disclosed is an apparatus for and method of using an in-system utility stage to provide service functions for wafer tables and other components in the photolithographic system in which the utility stage can access multiple tools without any need to open an enclosure containing the utility stage and the wafer tables and other components thus increasing throughput and decreasing downtime.
Claims14
A photolithographic apparatus comprising:
- an enclosure;
- at least one object table situated in the enclosure and adapted to travel between a plurality of positions in the enclosure;
- a utility device situated within the enclosure in a utility zone;
- a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone;
- and
- a tool store situated in the enclosure adjacent to the parked position and a plurality of tools stored in the tool store.
A photolithographic apparatus comprising:
- an enclosure;
- a first wafer table situated in the enclosure and adapted to move between a plurality of coplanar positions in the enclosure;
- a second wafer table situated in the enclosure and adapted to move between the plurality of coplanar positions in the enclosure, the second wafer table being moved in such a way as to avoid interfering with motion of the first wafer table and the first wafer table being moved in such a way as to avoid interfering with motion of the second wafer table;
- a utility device situated within the enclosure in a utility zone and adapted to perform a utility operation on a wafer;
- a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone, the utility stage being moved and positioned in such a way as to avoid interfering with motion of the first wafer table and the second wafer table;
- and
- a tool store situated in the enclosure adjacent to the parked position and a plurality of tools stored in the tool store.
A method of operating a photolithographic apparatus, the photolithographic apparatus comprising an enclosure, a first wafer table situated in the enclosure and adapted to move between a plurality of coplanar positions in the enclosure, a second wafer table situated in the enclosure and adapted to between a plurality of coplanar positions in the enclosure, a utility device situated within the enclosure in a utility zone and adapted to perform a utility operation on a wafer, and a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone, the method comprising:
- situating the first wafer table at a first neutral position at which the first wafer table will not interfere with motion of the utility stage from the parked position to the utility zone;
- situating the second wafer table at a second neutral position at which the second wafer table will not interfere with motion of the utility stage from the parked position to the utility zone;
- and
- moving the utility stage from the parked position to the utility device utility zone, wherein the utility stage unloads a tool from a tool store when the utility stage is at the parked position.
Dependencies are inferred from the claim text.