A pellicle cleaning system
AssigneeASML Netherlands B.V.
InventorsEdwin Edwin TE SLIGTE, Alexander Ludwig KLEIN, Paul Alexander VERMEULEN, Abraham Jan WOLF, Ilja GRISIN
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Abstract
A cleaning system for cleaning a component related to a lithographic process such as a pellicle, reticle, wafer or another lithographic component, the system including at least one radiation emitter configured to, in use, irradiate a region of the component so as to cause thermomechanical vibrations in the component and/or induce sputtering of contaminants present on the component.
Claims26
A cleaning system for cleaning a component related to a lithographic process, the cleaning system comprising:
- at least one radiation emitter configured to, in use, irradiate a region of the component so as to:
- cause thermomechanical vibrations in the component;
- and/or
- induce sputtering of contaminants present on the component.
A system for testing structural integrity of a component related to a lithographic process, the system comprising:
- at least one radiation emitter configured to, in use, irradiate a region of the component so as to cause thermomechanical vibrations in the component.
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A method of cleaning a component related to a lithographic process, the method comprising irradiating a region of the component so as to:
- induce thermomechanical vibrations in the component;
- and/or
- induce sputtering of contaminants present on the component.
A method of testing the structural integrity of a component related to a lithographic processing, the method comprising irradiating a region of the component so as to induce thermomechanical vibrations in the component.
-42. (canceled)
Dependencies are inferred from the claim text.