G03F 7/70916
Pollution mitigation, i.e. mitigating effect of contamination or debris
Official title: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps}
G03F7/70916 (Pollution mitigation, i.e. mitigating effect of contamination or debris) appears on 1,019 US grants and 1,226 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,019
- Published applications
- 1,226
- Assignees
- 164
- Inventors
- 1,969
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 4 | 0 |
| 1996 | 7 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 7 | 0 |
| 2001 | 13 | 8 |
| 2002 | 9 | 27 |
| 2003 | 17 | 18 |
| 2004 | 23 | 32 |
| 2005 | 24 | 63 |
| 2006 | 40 | 78 |
| 2007 | 52 | 91 |
| 2008 | 50 | 77 |
| 2009 | 38 | 73 |
| 2010 | 52 | 63 |
| 2011 | 51 | 61 |
| 2012 | 44 | 37 |
| 2013 | 49 | 26 |
| 2014 | 45 | 28 |
| 2015 | 30 | 30 |
| 2016 | 36 | 31 |
| 2017 | 35 | 28 |
| 2018 | 28 | 25 |
| 2019 | 36 | 34 |
| 2020 | 36 | 64 |
| 2021 | 47 | 53 |
| 2022 | 50 | 71 |
| 2023 | 57 | 73 |
| 2024 | 44 | 46 |
| 2025 | 52 | 51 |
| 2026 | 23 | 38 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Gripper and lithographic apparatus comprising the gripper8 Sep 2026US 12,730,386 B2ASML Netherlands B. V.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Cleaning structure surface in light source chamber1 Oct 2026US 2026/0299442 A1ASML Netherlands B. V.
- Debris catcher, rotating target extreme ultraviolet (euv) radiation generation system, method of generating euv radiation, method of inspecting photomask, method of manufacturing semiconductor device27 Aug 2026US 2026/0251986 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Debris trap unit and light source apparatus27 Aug 2026US 2026/0255465 A1Ushio Denki Kabushiki Kaisha
- Debris trap, extreme ultraviolet light generation apparatus, and electronic device manufacturing method13 Aug 2026US 2026/0235969 A1Gigaphoton Inc.
Most cited
By later US patents
- System for detecting base contaminants in air504US 6,096,267 AExtraction Systems, Inc. · 2000
- Lithographic apparatus and device manufacturing method282US 7,075,616 B2ASML Netherlands B. V. · 2006
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Projection exposure apparatus and method172US 6,496,257 B1Nikon Corporation · 2002