Debris catcher, rotating target extreme ultraviolet (euv) radiation generation system, method of generating euv radiation, method of inspecting photomask, method of manufacturing semiconductor device

A rotating target extreme ultraviolet (EUV) radiation generation system comprising:

• a vessel forming a chamber;
• a crucible disposed in the chamber, the crucible including a cavity and a peripheral wall surrounding the cavity, and the crucible configured to rotate about an axis at a center of the cavity;
• a catcher disposed over the cavity of the crucible, the catcher including a concave surface facing a portion of an interior surface of the peripheral wall of the crucible;
• a frame suspending the catcher over the crucible;
• a shield disposed over the frame;
• and
• a shim comprising a thermally conductive material disposed in a gap between the frame and the shield.

A method of generating extreme ultraviolet (EUV) radiation comprising:

• rotating a crucible including an inner peripheral wall retaining a target material, wherein the crucible is disposed inside a vessel;
• irradiating the target material with a laser to generate a plasma emitting the EUV radiation;
• and
• directing debris formed during the generation of the plasma with a catcher disposed over the crucible, wherein the catcher includes a concave surface facing the target material, and the concave surface exhibits a water contact angle (Θ) of greater than 85°.