Debris trap, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation apparatus;
• outputting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation apparatus including:
• a chamber configured to generate plasma by irradiation of a target substance with laser light;
• an exhaust path including a gas inlet port through which a gas containing debris flows from the chamber and a gas exhaust port through which the gas is exhausted;
• and
• a debris trap being arranged on the exhaust path,
• the debris trap including a first multi-tube and a second multi-tube arranged respectively along a first direction which is a flow direction of the gas traveling from the gas inlet port to the gas exhaust port,
• each of the first multi-tube and the second multi-tube including a plurality of tubes having different maximum outer dimensions in a second direction perpendicular to the first direction,
• the second multi-tube being arranged downstream of the first multi-tube in the first direction, and
• a number of tubes configuring the second multi-tube being more than a number of tubes configuring the first multi-tube.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with extreme ultraviolet light generated by an extreme ultraviolet light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet light generation apparatus including:
• a chamber configured to generate plasma by irradiation of a target substance with laser light;
• an exhaust path including a gas inlet port through which a gas containing debris flows from the chamber and a gas exhaust port through which the gas is exhausted;
• and
• a debris trap being arranged on the exhaust path,
• the debris trap including a first multi-tube and a second multi-tube arranged respectively along a first direction which is a flow direction of the gas traveling from the gas inlet port to the gas exhaust port,
• each of the first multi-tube and the second multi-tube including a plurality of tubes having different maximum outer dimensions in a second direction perpendicular to the first direction,
• the second multi-tube being arranged downstream of the first multi-tube in the first direction, and
• a number of tubes configuring the second multi-tube being more than a number of tubes configuring the first multi-tube.