G03F 7/70941
Stray fields and charges
Official title: {Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss}
G03F7/70941 (Stray fields and charges) appears on 239 US grants and 280 published applications in this corpus.
Search patents in G03F- Granted patents
- 239
- Published applications
- 280
- Assignees
- 71
- Inventors
- 607
- Latest grant
- 10 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 5 |
| 2002 | 2 | 6 |
| 2003 | 6 | 13 |
| 2004 | 11 | 23 |
| 2005 | 16 | 21 |
| 2006 | 14 | 26 |
| 2007 | 13 | 12 |
| 2008 | 12 | 19 |
| 2009 | 15 | 17 |
| 2010 | 16 | 19 |
| 2011 | 11 | 18 |
| 2012 | 15 | 17 |
| 2013 | 19 | 13 |
| 2014 | 11 | 4 |
| 2015 | 15 | 7 |
| 2016 | 9 | 7 |
| 2017 | 5 | 8 |
| 2018 | 8 | 4 |
| 2019 | 6 | 8 |
| 2020 | 5 | 6 |
| 2021 | 4 | 3 |
| 2022 | 5 | 7 |
| 2023 | 5 | 6 |
| 2024 | 1 | 1 |
| 2025 | 5 | 6 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Information processing apparatus, inspection method, storage medium, exposure apparatus, determination method, and article manufacturing method10 Feb 2026US 12,547,068 B2Canon Kabushiki Kaisha
- Method of reducing undesired light influence in extreme ultraviolet exposure6 Jan 2026US 12,517,434 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Contaminant analyzing metrology system, lithographic apparatus, and methods thereof14 Oct 2025US 12,442,759 B2ASML Holding N. V.
- Substrate holding board, manufacturing method of device, and exposure device9 Sep 2025US 12,411,426 B2Canon Kabushiki Kaisha
- Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate4 Mar 2025US 12,242,204 B2ASML Netherlands B. V.
- Exposure device and substrate support member30 Jul 2026US 2026/0219586 A1Nikon Corporation
- System and method for discharging a patterning device30 Jul 2026US 2026/0219591 A1ASML Netherlands B. V.
- Optical system for metrology21 May 2026US 2026/0140454 A1ASML Netherlands B. V.
- Viewport assembly for an extreme ultraviolet light source1 Jan 2026US 2026/0003298 A1ASML Netherlands B. V.
- Contamination determination2 Oct 2025US 2025/0306480 A1ASML Netherlands B. V.
Most cited
By later US patents
- Optical system, in particular projection-illumination unit used in microlithography75US 6,307,688 B1Carl-Zeiss-Stiftung · 2001
- Characterization of transmission losses in an optical system58US 7,791,724 B2ASML Netherlands B. V. · 2010
- Exposure apparatus and method with multiple light receiving means36US 5,892,573 ACanon Kabushiki Kaisha · 1999
- Compensation of flare-induced CD changes EUVL33US 6,815,129 B1Euv LLC · 2004
- Interferometric at-wavelength flare characterization of EUV optical systems31US 6,233,056 B1The Regents of the University of California · 2001