Exposure apparatus and method with multiple light receiving means
AssigneeCanon Kabushiki Kaisha
InventorsKazuhiro Takahashi, Takahisa Shiozawa
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Abstract
An exposure apparatus including an illumination optical system, a first light receiving system for receiving a portion of exposure light from the illumination optical system, a movable reticle stage having a transmitting portion for transmitting exposure light, and a second light receiving system for receiving the exposure light transmitted through the transmitting portion. Accordingly, the exposure apparatus is able to correct the sensitivity of the first light receiving system without unloading a reticle.
Claims22
An exposure apparatus, comprising:
- an illumination optical system;
- first light receiving means for receiving a portion of exposure light from said illumination optical system;
- a movable reticle stage having a transmitting portion, defined at a position other than a location where the reticle is to be placed, for transmitting exposure light;
- and
- second light receiving means for receiving the exposure light transmitted through said transmitting portion.
An exposure method for use with an exposure apparatus having an illumination optical system, first light receiving means for receiving a portion of exposure light from the illumination optical system, a projection optical system, and second light receiving means for receiving exposure light transmitted through at least a portion of the projection optical system, wherein a reticle is illuminated with the illumination optical system so that a pattern of the reticle is transferred to a wafer, said method comprising the steps of:
- detecting a first ratio between detected values of the first and second light receiving means in a state in which the reticle is not disposed on a path of exposure light, and a second ratio between detected values of the first and second light receiving means in a state in which the reticle is disposed on the path of exposure light;
- detecting a third ratio between detected values of the first and second light receiving means in a state, after at least one exposure processes, the reticle is disposed on the path of exposure light;
- and
- correcting a sensitivity of the first light receiving means on the basis of the first, second and third ratios.
An exposure apparatus, comprising:
- an illumination optical system;
- first light receiving means for receiving a portion of exposure light from the illumination optical system;
- a projection optical system;
- second light receiving means for receiving exposure light transmitted through at least a portion of the projection optical system;
- correcting means for correcting a sensitivity of a detected value of said first light receiving means, said correcting means is serviceable (i) to detect a first ratio between detected values of the first and second light receiving means in a state in which the reticle is not disposed on a path of exposure light, (ii) to detect a second ratio between detected values of the first and second light receiving means in a state in which the reticle is disposed on the path of exposure light, (iii) to detect a third ratio between detected values of the first and second light receiving means in a state, after at least one exposure processes, the reticle is disposed on the path of exposure light, and (iv) to correct a sensitivity of the first light receiving means on the basis of the first, second and third ratios.
A device manufacturing method including transferring a pattern of a reticle onto a wafer, said method comprising the steps of:
- detecting a light quantity of a portion of exposure light from an illumination optical system, by use of first light detecting means;
- detecting, by use of second light receiving means, a light quantity of exposure light passed through a transmitting portion of a movable reticle stage defined at a position thereon other than a location where the reticle is to be placed;
- and
- correcting a sensitivity of the first light detecting means, on the basis of detected values of the first and second light receiving means.
A device manufacturing method for use with an exposure apparatus having an illumination optical system, first light receiving means for receiving a portion of exposure light from the illumination optical system, a projection optical system, and second light receiving means for receiving exposure light transmitted through at least a portion of the projection optical system, wherein a reticle is illuminated with the illumination optical system so that a pattern of the reticle is transferred to a wafer, said method comprising the steps of:
- detecting a first ratio between detected values of the first and second light receiving means in a state in which the reticle is not disposed on a path of exposure light, and a second ratio between detected values of the first and second light receiving means in a state in which the reticle is disposed on the path of exposure light;
- detecting a third ratio between detected values of the first and second light receiving means in a state, after at least one exposure processes, the reticle is disposed on the path of exposure light;
- and
- correcting a sensitivity of the first light receiving means on the basis of the first, second and third ratios.
Dependencies are inferred from the claim text.