System and method for discharging a patterning device
AssigneeASML Netherlands B.V.
InventorsVladimir KVON, Lucas Christiaan Johan HEIJMANS, Andrey NIKIPELOV, Zahra MARVI, Max KOOLE
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Abstract
A light source arranged to illuminate a non-patterning surface of a patterning device in a lithographic apparatus, wherein the light source is configured such that, in response to illumination from the light source, the non-patterning surface emits electrons due to the photoelectric effect. Advantageously, when the non-patterning surface is charged, the non-patterning surface may be discharged before it is unloaded.
Claims20
A light source arranged to illuminate a non-patterning surface of a patterning device in a lithographic apparatus, wherein the light source is configured such that, in response to illumination from the light source, the non-patterning surface emits electrons due to the photoelectric effect.
A lithographic apparatus comprising:
- a support structure configured to support a patterning device;
- one or more light sources arranged to illuminate a non-patterning surface of the patterning device in the lithographic apparatus, wherein the one or more light sources are configured such that, in response to illumination from the one or more light sources, the non-patterning surface emits electrons due to the photoelectric effect;
- and
- a controller arranged to control the illumination of the patterning device of the system by the one or more light sources.
A method of reducing the charge of a charged non-patterning surface of a patterning device in a lithographic apparatus, the method comprising illuminating the non-patterning surface with light such that the non-patterning surface emits electrons due to the photoelectric effect.
Dependencies are inferred from the claim text.